On the Formation of Amorphous Ge Nanoclusters and Ge Nanocrystals in GeSixOy Films on Quartz Substrates by Furnace and Pulsed Laser Annealing

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On the Formation of Amorphous Ge Nanoclusters and Ge Nanocrystals in GeSi_xO_y Films on Quartz Substrates by Furnace and Pulsed Laser Annealing. / Zhang Fan, Fan; Kochubey, S. A.; Stoffel, M. и др.

в: Semiconductors, Том 54, № 3, 01.03.2020, стр. 322-329.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

BibTeX

@article{efbe8a8e1a744eda82162a5675bdbb11,

title = "On the Formation of Amorphous Ge Nanoclusters and Ge Nanocrystals in GeSixOy Films on Quartz Substrates by Furnace and Pulsed Laser Annealing",

abstract = "Nonstoichiometric GeO0.5[SiO2]0.5 and GeO0.5[SiO]0.5 germanosilicate glassy films are produced by the high-vacuum coevaporation of GeO2 and either SiO or SiO2 powders with deposition onto a cold fused silica substrate. Then the films are subjected to furnace or laser annealing (a XeCl laser, λ = 308 nm, pulse duration of 15 ns). The properties of the samples are studied by transmittance and reflectance spectroscopy, Raman spectroscopy, and photoluminescence spectroscopy. As shown by analysis of the Raman spectra, the GeO[SiO] film deposited at a substrate temperature of 100°C contains amorphous Ge clusters, whereas no signal from Ge–Ge bond vibrations is observed in the Raman spectra of the GeO[SiO2] film deposited at the same temperature. The optical absorption edge of the as-deposited GeO[SiO2] film corresponds to ~400 nm; at the same time, in the GeO[SiO] film, absorption is observed right up to the near-infrared region, which is apparently due to absorption in Ge clusters. Annealing induces a shift of the absorption edge to longer wavelengths. After annealing of the GeO[SiO2] film at 450°C, amorphous germanium clusters are detected in the film, and after annealing at 550°C as well as after pulsed laser annealing, germanium nanocrystals are detected. The crystallization of amorphous Ge nanoclusters in the GeO[SiO] film requires annealing at a temperature of 680°C. In this case, the size of Ge nanoclusters in this film are smaller than that in the GeO[SiO2] film. It is not possible to crystallize Ge clusters in the GeO[SiO] film. It seems obvious that the smaller the semiconductor nanoclusters in an insulating matrix, the more difficult it is to crystallize them. In the low-temperature photoluminescence spectra of the annealed films, signals caused by either defects or Ge clusters are detected.",

keywords = "crystallization, germanium nanoclusters, germanosilicate glasses, pulsed laser annealing, CRYSTALLIZATION, GERMANIUM FILMS, SILICON, VISIBLE PHOTOLUMINESCENCE",

author = "{Zhang Fan}, Fan and Kochubey, {S. A.} and M. Stoffel and H. Rinnert and M. Vergnat and Volodin, {V. A.}",

year = "2020",

month = mar,

day = "1",

doi = "10.1134/S1063782620030070",

language = "English",

volume = "54",

pages = "322--329",

journal = "Semiconductors",

issn = "1063-7826",

publisher = "PLEIADES PUBLISHING INC",

number = "3",

}

RIS

TY - JOUR

T1 - On the Formation of Amorphous Ge Nanoclusters and Ge Nanocrystals in GeSixOy Films on Quartz Substrates by Furnace and Pulsed Laser Annealing

AU - Zhang Fan, Fan

AU - Kochubey, S. A.

AU - Stoffel, M.

AU - Rinnert, H.

AU - Vergnat, M.

AU - Volodin, V. A.

PY - 2020/3/1

Y1 - 2020/3/1

N2 - Nonstoichiometric GeO0.5[SiO2]0.5 and GeO0.5[SiO]0.5 germanosilicate glassy films are produced by the high-vacuum coevaporation of GeO2 and either SiO or SiO2 powders with deposition onto a cold fused silica substrate. Then the films are subjected to furnace or laser annealing (a XeCl laser, λ = 308 nm, pulse duration of 15 ns). The properties of the samples are studied by transmittance and reflectance spectroscopy, Raman spectroscopy, and photoluminescence spectroscopy. As shown by analysis of the Raman spectra, the GeO[SiO] film deposited at a substrate temperature of 100°C contains amorphous Ge clusters, whereas no signal from Ge–Ge bond vibrations is observed in the Raman spectra of the GeO[SiO2] film deposited at the same temperature. The optical absorption edge of the as-deposited GeO[SiO2] film corresponds to ~400 nm; at the same time, in the GeO[SiO] film, absorption is observed right up to the near-infrared region, which is apparently due to absorption in Ge clusters. Annealing induces a shift of the absorption edge to longer wavelengths. After annealing of the GeO[SiO2] film at 450°C, amorphous germanium clusters are detected in the film, and after annealing at 550°C as well as after pulsed laser annealing, germanium nanocrystals are detected. The crystallization of amorphous Ge nanoclusters in the GeO[SiO] film requires annealing at a temperature of 680°C. In this case, the size of Ge nanoclusters in this film are smaller than that in the GeO[SiO2] film. It is not possible to crystallize Ge clusters in the GeO[SiO] film. It seems obvious that the smaller the semiconductor nanoclusters in an insulating matrix, the more difficult it is to crystallize them. In the low-temperature photoluminescence spectra of the annealed films, signals caused by either defects or Ge clusters are detected.

AB - Nonstoichiometric GeO0.5[SiO2]0.5 and GeO0.5[SiO]0.5 germanosilicate glassy films are produced by the high-vacuum coevaporation of GeO2 and either SiO or SiO2 powders with deposition onto a cold fused silica substrate. Then the films are subjected to furnace or laser annealing (a XeCl laser, λ = 308 nm, pulse duration of 15 ns). The properties of the samples are studied by transmittance and reflectance spectroscopy, Raman spectroscopy, and photoluminescence spectroscopy. As shown by analysis of the Raman spectra, the GeO[SiO] film deposited at a substrate temperature of 100°C contains amorphous Ge clusters, whereas no signal from Ge–Ge bond vibrations is observed in the Raman spectra of the GeO[SiO2] film deposited at the same temperature. The optical absorption edge of the as-deposited GeO[SiO2] film corresponds to ~400 nm; at the same time, in the GeO[SiO] film, absorption is observed right up to the near-infrared region, which is apparently due to absorption in Ge clusters. Annealing induces a shift of the absorption edge to longer wavelengths. After annealing of the GeO[SiO2] film at 450°C, amorphous germanium clusters are detected in the film, and after annealing at 550°C as well as after pulsed laser annealing, germanium nanocrystals are detected. The crystallization of amorphous Ge nanoclusters in the GeO[SiO] film requires annealing at a temperature of 680°C. In this case, the size of Ge nanoclusters in this film are smaller than that in the GeO[SiO2] film. It is not possible to crystallize Ge clusters in the GeO[SiO] film. It seems obvious that the smaller the semiconductor nanoclusters in an insulating matrix, the more difficult it is to crystallize them. In the low-temperature photoluminescence spectra of the annealed films, signals caused by either defects or Ge clusters are detected.

KW - crystallization

KW - germanium nanoclusters

KW - germanosilicate glasses

KW - pulsed laser annealing

KW - CRYSTALLIZATION

KW - GERMANIUM FILMS

KW - SILICON

KW - VISIBLE PHOTOLUMINESCENCE

UR - http://www.scopus.com/inward/record.url?scp=85083988588&partnerID=8YFLogxK

U2 - 10.1134/S1063782620030070

DO - 10.1134/S1063782620030070

M3 - Article

AN - SCOPUS:85083988588

VL - 54

SP - 322

EP - 329

JO - Semiconductors

JF - Semiconductors

SN - 1063-7826

IS - 3

ER -

ID: 24229098