Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Formation of light-emitting defects in silicon by swift heavy ion irradiation and subsequent annealing. / Cherkova, S. G.; Volodin, V. A.; Skuratov, V. A. и др.
в: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Том 535, 02.2023, стр. 132-136.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Formation of light-emitting defects in silicon by swift heavy ion irradiation and subsequent annealing
AU - Cherkova, S. G.
AU - Volodin, V. A.
AU - Skuratov, V. A.
AU - Stoffel, M.
AU - Rinnert, H.
AU - Vergnat, M.
N1 - The study was supported by the Ministry of Science and Higher Education of the Russian Federation, project No. FWGW-2022-0011.
PY - 2023/2
Y1 - 2023/2
N2 - High-resistivity floating-zone silicon (FZ-Si) and n-type (4.5 Ohm·cm) Czochralski silicon (CZ-Si) wafers were irradiated at room temperature with 167 MeV Xe ions to fluences ranging from 5·1010 to 5·1011 cm−2. Temperature dependent photoluminescence (PL) measurements were performed to characterize the as-implanted and annealed silicon wafers. It was found that irradiation with swift heavy ions (SHI) leads to the formation of light-emitting defects in both types of silicon wafers. Low-temperature annealing (400 °C) leads to a significant increase of the photoluminescence intensity. In addition, the photoluminescence decreases for increasing measurement temperatures and eventually quenching is observed for temperatures larger than 80 K. The type of silicon wafer (FZ or CZ) does not significantly influence the defect-related light-emitting properties. This implies that low fluence SHI irradiation is a promising method for creation of light-emitting defects in silicon.
AB - High-resistivity floating-zone silicon (FZ-Si) and n-type (4.5 Ohm·cm) Czochralski silicon (CZ-Si) wafers were irradiated at room temperature with 167 MeV Xe ions to fluences ranging from 5·1010 to 5·1011 cm−2. Temperature dependent photoluminescence (PL) measurements were performed to characterize the as-implanted and annealed silicon wafers. It was found that irradiation with swift heavy ions (SHI) leads to the formation of light-emitting defects in both types of silicon wafers. Low-temperature annealing (400 °C) leads to a significant increase of the photoluminescence intensity. In addition, the photoluminescence decreases for increasing measurement temperatures and eventually quenching is observed for temperatures larger than 80 K. The type of silicon wafer (FZ or CZ) does not significantly influence the defect-related light-emitting properties. This implies that low fluence SHI irradiation is a promising method for creation of light-emitting defects in silicon.
KW - Defects in silicon
KW - Photoluminescence
KW - Silicon
KW - Swift heavy ions
UR - https://www.scopus.com/inward/record.url?eid=2-s2.0-85144284747&partnerID=40&md5=ad942002e542a6581ab2bb61d2eca5fd
UR - https://www.mendeley.com/catalogue/672db579-92ab-3a79-8ca2-24194bf41ff5/
U2 - 10.1016/j.nimb.2022.12.004
DO - 10.1016/j.nimb.2022.12.004
M3 - Article
VL - 535
SP - 132
EP - 136
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
ER -
ID: 49729864