Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Evolution of Micropits on Large Terraces of the Si(111) Surface during High-Temperature Annealing. / Petrov, A. S.; Sitnikov, S. V.; Kosolobov, S. S. и др.
в: Semiconductors, Том 53, № 4, 01.04.2019, стр. 434-438.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Evolution of Micropits on Large Terraces of the Si(111) Surface during High-Temperature Annealing
AU - Petrov, A. S.
AU - Sitnikov, S. V.
AU - Kosolobov, S. S.
AU - Latyshev, A. V.
PY - 2019/4/1
Y1 - 2019/4/1
N2 - Abstract: The transformation of micropits on large terraces of the Si(111) surface containing no vicinal atomic steps has been investigated by in situ ultrahigh-vacuum reflection electron microscopy upon thermal annealing of the substrate in the range of 1200–1400°C. A procedure for the formation of micropits on large terraces of the Si(111) surface with the application of focused-ion-beam (Ga + ) technology has been proposed. It has been found that the micropit decay kinetics varies upon reaching the critical radius R crit , which is caused by the activation of nucleation of two-dimensional vacancy islands on the micropit bottom. A theoretical model describing variations in the lateral sizes of the micropit both before and after reaching R crit has been proposed. Based on analysis of the found temperature dependence of the nucleation frequencies of two-dimensional vacancy pits on the micropit bottom, the effective energy of nucleation of a vacancy island has been determined to be 4.1 ± 0.1 eV.
AB - Abstract: The transformation of micropits on large terraces of the Si(111) surface containing no vicinal atomic steps has been investigated by in situ ultrahigh-vacuum reflection electron microscopy upon thermal annealing of the substrate in the range of 1200–1400°C. A procedure for the formation of micropits on large terraces of the Si(111) surface with the application of focused-ion-beam (Ga + ) technology has been proposed. It has been found that the micropit decay kinetics varies upon reaching the critical radius R crit , which is caused by the activation of nucleation of two-dimensional vacancy islands on the micropit bottom. A theoretical model describing variations in the lateral sizes of the micropit both before and after reaching R crit has been proposed. Based on analysis of the found temperature dependence of the nucleation frequencies of two-dimensional vacancy pits on the micropit bottom, the effective energy of nucleation of a vacancy island has been determined to be 4.1 ± 0.1 eV.
KW - ATOMIC STEPS
KW - KINETICS
KW - NUCLEATION
KW - MICROSCOPY
KW - PHASE
UR - http://www.scopus.com/inward/record.url?scp=85065433719&partnerID=8YFLogxK
U2 - 10.1134/S1063782619040237
DO - 10.1134/S1063782619040237
M3 - Article
AN - SCOPUS:85065433719
VL - 53
SP - 434
EP - 438
JO - Semiconductors
JF - Semiconductors
SN - 1063-7826
IS - 4
ER -
ID: 20163340