Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF2 on Si(111)

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Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF2 on Si(111). / Dvurechenskii, Anatoly V.; Kacyuba, Aleksey V.; Kamaev, Gennady N. и др.

в: Materials Today: Proceedings, Том 14, № 1, 68, 05.2023.

Результаты исследований: Научные публикации в периодических изданиях › статья по материалам конференции › Рецензирование

BibTeX

@article{3b85c1c4987d428cb16d689f97d9ae53,

title = "Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF2 on Si(111)",

abstract = "The formation of CaSi2 films on Si(111) with the molecular-beam epitaxy (MBE) of CaF2 under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi2 film synthesis assisted by electron-beam irradiation was developed. We combined two approaches to reduce the film roughness: the post-growth electron irradiation and codeposition of additional Si during CaF2 growth. The application of the solid-phase epitaxy technique at the initial stage of film growth allowed for us to reduce surface roughness down to 1–2 nm.",

author = "Dvurechenskii, {Anatoly V.} and Kacyuba, {Aleksey V.} and Kamaev, {Gennady N.} and Volodin, {Vladimir A.} and Stepina, {Natalia P.} and Zinovieva, {Aigul F.} and Zinovyev, {Vladimir A.}",

note = "This research was funded by the Ministry of Science and Higher Education of the Russian Federation (agreement No. 121052600074-4, project FWGW-2022-0009).; The 4th International Online Conference on Nanomaterials, IOCN 2023 ; Conference date: 05-05-2023 Through 19-05-2023",

year = "2023",

month = may,

doi = "10.3390/iocn2023-14481",

language = "English",

volume = "14",

journal = "Materials Today: Proceedings",

issn = "2214-7853",

publisher = "Elsevier Science B.V.",

number = "1",

}

RIS

TY - JOUR

T1 - Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF2 on Si(111)

AU - Dvurechenskii, Anatoly V.

AU - Kacyuba, Aleksey V.

AU - Kamaev, Gennady N.

AU - Volodin, Vladimir A.

AU - Stepina, Natalia P.

AU - Zinovieva, Aigul F.

AU - Zinovyev, Vladimir A.

N1 - Conference code: 4

PY - 2023/5

Y1 - 2023/5

N2 - The formation of CaSi2 films on Si(111) with the molecular-beam epitaxy (MBE) of CaF2 under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi2 film synthesis assisted by electron-beam irradiation was developed. We combined two approaches to reduce the film roughness: the post-growth electron irradiation and codeposition of additional Si during CaF2 growth. The application of the solid-phase epitaxy technique at the initial stage of film growth allowed for us to reduce surface roughness down to 1–2 nm.

AB - The formation of CaSi2 films on Si(111) with the molecular-beam epitaxy (MBE) of CaF2 under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi2 film synthesis assisted by electron-beam irradiation was developed. We combined two approaches to reduce the film roughness: the post-growth electron irradiation and codeposition of additional Si during CaF2 growth. The application of the solid-phase epitaxy technique at the initial stage of film growth allowed for us to reduce surface roughness down to 1–2 nm.

UR - https://www.mendeley.com/catalogue/53654edb-7d9c-3d16-881d-955264325454/

U2 - 10.3390/iocn2023-14481

DO - 10.3390/iocn2023-14481

M3 - Conference article

VL - 14

JO - Materials Today: Proceedings

JF - Materials Today: Proceedings

SN - 2214-7853

IS - 1

M1 - 68

T2 - The 4th International Online Conference on Nanomaterials

Y2 - 5 May 2023 through 19 May 2023

ER -

ID: 55437454