TY - JOUR

T1 - Electrohydrodynamic emitters of ion beams

AU - Mazarov, P.

AU - Dudnikov, V. G.

AU - Tolstoguzov, A. B.

N1 - Publisher Copyright: © 2020 Uspekhi Fizicheskikh Nauk. All rights reserved. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.

PY - 2020/12

Y1 - 2020/12

N2 - We discuss physical processes underlying the generation of ion beams with high emission current density in electrohydrodynamic (EHD) emitters based on liquid metals and alloys and with room temperature ionic liquids. We consider EHD effects that influence the emission of ions (ion production mechanisms) and the kinetics of ion interactions in high-density beams. We analyze the factors determining the emission zone size, sustainability of emission at high and low currents, generation of clusters, increase in energy spread, decrease in brightness, and other features of ion beams. We consider the specific design features of EHD emitters and the problems of practically ensuring their stable operation. Discussed in detail are modern application areas for ion sources with EHD emitters, including technological installations for ion beam lithography, micro- and nanopatterning, ion microscopes and tools for local mass spectrometry of secondary ions, and systems to control and neutralize the potential of spacecraft as well as electrostatic rocket engines (microthrusters). We analyze prospects for further development of EHD emitters themselves and instruments based on them.

AB - We discuss physical processes underlying the generation of ion beams with high emission current density in electrohydrodynamic (EHD) emitters based on liquid metals and alloys and with room temperature ionic liquids. We consider EHD effects that influence the emission of ions (ion production mechanisms) and the kinetics of ion interactions in high-density beams. We analyze the factors determining the emission zone size, sustainability of emission at high and low currents, generation of clusters, increase in energy spread, decrease in brightness, and other features of ion beams. We consider the specific design features of EHD emitters and the problems of practically ensuring their stable operation. Discussed in detail are modern application areas for ion sources with EHD emitters, including technological installations for ion beam lithography, micro- and nanopatterning, ion microscopes and tools for local mass spectrometry of secondary ions, and systems to control and neutralize the potential of spacecraft as well as electrostatic rocket engines (microthrusters). We analyze prospects for further development of EHD emitters themselves and instruments based on them.

KW - electrodynamics

KW - liquid metal ion source

KW - room temperature ionic liquid

KW - nanopatterning

KW - secondary ion mass spectrometry

KW - ion beam lithography

KW - liquid metals and alloys

KW - nanotechnology

KW - CURRENT-DENSITY PROFILES

KW - DIRECT FIELD-EVAPORATION

KW - TEM SAMPLE PREPARATION

KW - CURRENT-VOLTAGE CURVES

KW - LIQUID-METAL SOURCES

KW - DOUBLY-CHARGED IONS

KW - VIRTUAL SOURCE SIZE

KW - MASS-SPECTROMETRY

KW - ELECTRON-EMISSION

KW - TEMPERATURE-DEPENDENCE

KW - Liquid metals and alloys

KW - Ion beam lithography

KW - Nanopatterning

KW - Liquid metal ion source

KW - Electrodynamics

KW - Secondary ion mass spectrometry

KW - Room temperature ionic liquid

KW - Nanotechnology

UR - http://www.scopus.com/inward/record.url?scp=85102730097&partnerID=8YFLogxK

U2 - 10.3367/UFNe.2020.09.038845

DO - 10.3367/UFNe.2020.09.038845

M3 - Article

VL - 63

SP - 1219

EP - 1255

JO - Physics-Uspekhi

JF - Physics-Uspekhi

SN - 1063-7869

IS - 12

ER -