Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water

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Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water. / Khizhnyak, E. A.; Shayapov, V. R.; Korolkov, I. V. и др.

в: Journal of Structural Chemistry, Том 66, № 2, 10.03.2025, стр. 293-303.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

BibTeX

@article{a1bb5fd1fca34e3ebb3eb2c4085e04b9,

title = "Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water",

abstract = "Abstract: Titanium dioxide TiO2 films are obtained from titanium tetrachloride and water by atomic layer deposition. A change in the phase composition of the films is found when the deposition and annealing temperatures are varied. At a deposition temperature of 150 °C amorphous films are formed; at 200-400 °C films containing the anatase phase are formed; a mixture of anatase and rutile phases is formed in high-temperature films (deposition temperatures of 450 °C and 500 °C). Annealing of high-temperature films at 400 °C and 500 °C increases the relative intensity of rutile reflections. The film morphology is analyzed by scanning electron and atomic force microscopy techniques. As the deposition temperature increases, grains enlarge on the film surface.",

keywords = "anatase, annealing, atomic layer deposition, rutile, thin films, titanium dioxide",

author = "Khizhnyak, {E. A.} and Shayapov, {V. R.} and Korolkov, {I. V.} and Dudkina, {S. P.} and Geydt, {P. V.} and Lebedev, {M. S.}",

note = "The work was supported by the Ministry of Science and Higher Education of the Russian Federation, project No. 121031700314-5. The surface morphology of the samples was analyzed using the facilities of the Multi-Access Center “High Technologies and Analytics of Nanosystems”, Novosibirsk State University. Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water / E. A. Khizhnyak, V. R. Shayapov, I. V. Korolkov [et al.] // Journal of Structural Chemistry. – 2025. – Vol. 66, No. 2. – P. 293-303. – DOI 10.1134/S0022476625020088.",

year = "2025",

month = mar,

day = "10",

doi = "10.1134/S0022476625020088",

language = "English",

volume = "66",

pages = "293--303",

journal = "Journal of Structural Chemistry",

issn = "0022-4766",

publisher = "Springer",

number = "2",

}

RIS

TY - JOUR

T1 - Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water

AU - Khizhnyak, E. A.

AU - Shayapov, V. R.

AU - Korolkov, I. V.

AU - Dudkina, S. P.

AU - Geydt, P. V.

AU - Lebedev, M. S.

N1 - The work was supported by the Ministry of Science and Higher Education of the Russian Federation, project No. 121031700314-5. The surface morphology of the samples was analyzed using the facilities of the Multi-Access Center “High Technologies and Analytics of Nanosystems”, Novosibirsk State University. Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water / E. A. Khizhnyak, V. R. Shayapov, I. V. Korolkov [et al.] // Journal of Structural Chemistry. – 2025. – Vol. 66, No. 2. – P. 293-303. – DOI 10.1134/S0022476625020088.

PY - 2025/3/10

Y1 - 2025/3/10

N2 - Abstract: Titanium dioxide TiO2 films are obtained from titanium tetrachloride and water by atomic layer deposition. A change in the phase composition of the films is found when the deposition and annealing temperatures are varied. At a deposition temperature of 150 °C amorphous films are formed; at 200-400 °C films containing the anatase phase are formed; a mixture of anatase and rutile phases is formed in high-temperature films (deposition temperatures of 450 °C and 500 °C). Annealing of high-temperature films at 400 °C and 500 °C increases the relative intensity of rutile reflections. The film morphology is analyzed by scanning electron and atomic force microscopy techniques. As the deposition temperature increases, grains enlarge on the film surface.

AB - Abstract: Titanium dioxide TiO2 films are obtained from titanium tetrachloride and water by atomic layer deposition. A change in the phase composition of the films is found when the deposition and annealing temperatures are varied. At a deposition temperature of 150 °C amorphous films are formed; at 200-400 °C films containing the anatase phase are formed; a mixture of anatase and rutile phases is formed in high-temperature films (deposition temperatures of 450 °C and 500 °C). Annealing of high-temperature films at 400 °C and 500 °C increases the relative intensity of rutile reflections. The film morphology is analyzed by scanning electron and atomic force microscopy techniques. As the deposition temperature increases, grains enlarge on the film surface.

KW - anatase

KW - annealing

KW - atomic layer deposition

KW - rutile

KW - thin films

KW - titanium dioxide

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UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-86000787769&origin=inward&txGid=d4dbb037daf73865267cf46f3ba82a64

UR - https://www.elibrary.ru/item.asp?id=80438832

U2 - 10.1134/S0022476625020088

DO - 10.1134/S0022476625020088

M3 - Article

VL - 66

SP - 293

EP - 303

JO - Journal of Structural Chemistry

JF - Journal of Structural Chemistry

SN - 0022-4766

IS - 2

ER -

ID: 65066732