Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Dielectric Function of 2D Tungsten Disulfide in Homo‐and Heterobilayer Stacking. / Peci, Ermes ; Magnozzi, Michele ; Ramó, Lorenzo и др.
в: Advanced Materials Interfaces, Том 10, № 3, 2201586, 26.01.2023.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Dielectric Function of 2D Tungsten Disulfide in Homo‐and Heterobilayer Stacking
AU - Peci, Ermes
AU - Magnozzi, Michele
AU - Ramó, Lorenzo
AU - Ferrera, Marzia
AU - Convertino, Domenica
AU - Pace, Simona
AU - Orlandini, Giorgio
AU - Sharma, Apoorva
AU - Milekhin, Ilya
AU - Salvan, Georgeta
AU - Coletti, Camilla
AU - Zahn, Dietrich R.T.
AU - Bisio, Francesco
AU - Canepa, Maurizio
N1 - Acknowledgements: The research leading to these results has received funding from Compagnia di San Paolo (project STRATOS) and Ministero dell'Istruzione, dell'Universitá e della Ricerca: PRIN 2017 grant number 2017KFY7XF, Dipartimenti di Eccellenza 2018–2022, and the European Union Horizon 2020 Programme under grant agreement no. 881603 Graphene Core 3. The authors acknowledge support from DAAD (German Academic Exchange Service) Research Grants—Short-Term Grants, 2021 (57552336).
PY - 2023/1/26
Y1 - 2023/1/26
N2 - The opto-electronic properties of semiconducting 2D materials can be flexibly manipulated by engineering the atomic-scale environment. This can be done by including 2D materials in tailored van der Waals (vdW) stacks, whose optical response is a function of the number and the type of adjacent 2D layers. This work reports a systematic investigation of the dielectric function of 2D semiconducting WS2 in various stacking configurations: monolayer, 3R/2H homobilayer, and WS2/MoS2 heterobilayer. Reliable, Kramers–Kronig-consistent dielectric functions are obtained for WS2 in each configuration by means of spectroscopic ellipsometry (SE) and related parametric optical modeling in a wide spectral range (1.55–3.10 eV). The results of SE are combined with photoluminescence and absorbance spectra to identify the spectral position of the main excitonic features in WS2, which manifest sizable redshifts depending on the stacking configuration. These results represent a consistent reference set for the dielectric function of WS2 in vdW stacking configurations of particular interest for the scientific and technological field, and can be fruitfully exploited for reliable predictions of the optical response of WS2-containing systems.
AB - The opto-electronic properties of semiconducting 2D materials can be flexibly manipulated by engineering the atomic-scale environment. This can be done by including 2D materials in tailored van der Waals (vdW) stacks, whose optical response is a function of the number and the type of adjacent 2D layers. This work reports a systematic investigation of the dielectric function of 2D semiconducting WS2 in various stacking configurations: monolayer, 3R/2H homobilayer, and WS2/MoS2 heterobilayer. Reliable, Kramers–Kronig-consistent dielectric functions are obtained for WS2 in each configuration by means of spectroscopic ellipsometry (SE) and related parametric optical modeling in a wide spectral range (1.55–3.10 eV). The results of SE are combined with photoluminescence and absorbance spectra to identify the spectral position of the main excitonic features in WS2, which manifest sizable redshifts depending on the stacking configuration. These results represent a consistent reference set for the dielectric function of WS2 in vdW stacking configurations of particular interest for the scientific and technological field, and can be fruitfully exploited for reliable predictions of the optical response of WS2-containing systems.
KW - dielectric function
KW - dielectric screening
KW - ellipsometry
KW - tungsten disulfide
KW - van der Waals bilayer
UR - https://www.mendeley.com/catalogue/5c33529f-3969-3b07-8ab3-7f94cf2030eb/
U2 - 10.1002/admi.202201586
DO - 10.1002/admi.202201586
M3 - Article
VL - 10
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
SN - 2196-7350
IS - 3
M1 - 2201586
ER -
ID: 43522102