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Borate nonlinear optical single crystal surface finishing by argon cluster ion sputtering. / Korobeishchikov, N. G.; Nikolaev, I. V.; Atuchin, V. V. и др.

в: Surfaces and Interfaces, Том 27, 101520, 12.2021.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

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Korobeishchikov NG, Nikolaev IV, Atuchin VV, Prosvirin IP, Tolstogouzov A, Pelenovich V и др. Borate nonlinear optical single crystal surface finishing by argon cluster ion sputtering. Surfaces and Interfaces. 2021 дек.;27:101520. doi: 10.1016/j.surfin.2021.101520

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BibTeX

@article{0131af6ef10d4e5b9e84aeb5e7648018,
title = "Borate nonlinear optical single crystal surface finishing by argon cluster ion sputtering",
abstract = "Due to its distinctive features, gas cluster ion beams offer unique capabilities to improve the performance of optical devices based on nonlinear single crystals. In this work, the applicability of the argon cluster ion sputtering at different incident energies for finishing the LiB3O5 surface has been studied. It is demonstrated that a combination of high- and low-energy treatment modes (energy per atom of about 100 eV and several eV, respectively) provides an efficient etching rate comparable to that of a monoatomic ion beam. Besides, the surface roughness is reduced to the angstrom level in a wide range of spatial frequencies (ν = 0.3–100 μm–1). Using XPS measurements, the preferential sputtering of oxygen and, to a lesser extent, boron, and an increase in the concentration of lithium cations in both modes were revealed. Although a chemical alteration of the treated materials could not be fully prevented, chemical and physical damages after a cluster bombardment are much less than that from a monoatomic ion beam.",
keywords = "AFM, Gas cluster ion beam, LiBO, Surface sputtering, XPS",
author = "Korobeishchikov, {N. G.} and Nikolaev, {I. V.} and Atuchin, {V. V.} and Prosvirin, {I. P.} and A. Tolstogouzov and V. Pelenovich and Fu, {D. J.}",
note = "Funding Information: This work was funded by the Russian Science Foundation under grant No. 21–19–00046 . Publisher Copyright: {\textcopyright} 2021 Elsevier B.V.",
year = "2021",
month = dec,
doi = "10.1016/j.surfin.2021.101520",
language = "English",
volume = "27",
journal = "Surfaces and Interfaces",
issn = "2468-0230",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Borate nonlinear optical single crystal surface finishing by argon cluster ion sputtering

AU - Korobeishchikov, N. G.

AU - Nikolaev, I. V.

AU - Atuchin, V. V.

AU - Prosvirin, I. P.

AU - Tolstogouzov, A.

AU - Pelenovich, V.

AU - Fu, D. J.

N1 - Funding Information: This work was funded by the Russian Science Foundation under grant No. 21–19–00046 . Publisher Copyright: © 2021 Elsevier B.V.

PY - 2021/12

Y1 - 2021/12

N2 - Due to its distinctive features, gas cluster ion beams offer unique capabilities to improve the performance of optical devices based on nonlinear single crystals. In this work, the applicability of the argon cluster ion sputtering at different incident energies for finishing the LiB3O5 surface has been studied. It is demonstrated that a combination of high- and low-energy treatment modes (energy per atom of about 100 eV and several eV, respectively) provides an efficient etching rate comparable to that of a monoatomic ion beam. Besides, the surface roughness is reduced to the angstrom level in a wide range of spatial frequencies (ν = 0.3–100 μm–1). Using XPS measurements, the preferential sputtering of oxygen and, to a lesser extent, boron, and an increase in the concentration of lithium cations in both modes were revealed. Although a chemical alteration of the treated materials could not be fully prevented, chemical and physical damages after a cluster bombardment are much less than that from a monoatomic ion beam.

AB - Due to its distinctive features, gas cluster ion beams offer unique capabilities to improve the performance of optical devices based on nonlinear single crystals. In this work, the applicability of the argon cluster ion sputtering at different incident energies for finishing the LiB3O5 surface has been studied. It is demonstrated that a combination of high- and low-energy treatment modes (energy per atom of about 100 eV and several eV, respectively) provides an efficient etching rate comparable to that of a monoatomic ion beam. Besides, the surface roughness is reduced to the angstrom level in a wide range of spatial frequencies (ν = 0.3–100 μm–1). Using XPS measurements, the preferential sputtering of oxygen and, to a lesser extent, boron, and an increase in the concentration of lithium cations in both modes were revealed. Although a chemical alteration of the treated materials could not be fully prevented, chemical and physical damages after a cluster bombardment are much less than that from a monoatomic ion beam.

KW - AFM

KW - Gas cluster ion beam

KW - LiBO

KW - Surface sputtering

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=85122800789&partnerID=8YFLogxK

U2 - 10.1016/j.surfin.2021.101520

DO - 10.1016/j.surfin.2021.101520

M3 - Article

AN - SCOPUS:85122800789

VL - 27

JO - Surfaces and Interfaces

JF - Surfaces and Interfaces

SN - 2468-0230

M1 - 101520

ER -

ID: 35261286