Tin-catalyzed oriented array of microropes of silicon oxide nanowires synthesized on different substrates

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Tin-catalyzed oriented array of microropes of silicon oxide nanowires synthesized on different substrates. / Zamchiy, A. O.; Baranov, E. A.; Khmel, S. Ya.

In: Vacuum, Vol. 147, 01.01.2018, p. 99-106.

Research output: Contribution to journal › Article › peer-review

BibTeX

@article{ec7acdadabd54d6f830ad6574bc7e075,

title = "Tin-catalyzed oriented array of microropes of silicon oxide nanowires synthesized on different substrates",

abstract = "Silicon oxide (SiOx) nanowires were synthesized from a monosilane–argon–hydrogen mixture on substrates of different materials (monocrystalline silicon (c-Si), glass, stainless steel, copper, and copper with a SiO2 barrier layer) coated with a tin catalyst film 60 nm thick using the gas-jet electron beam plasma chemical vapor deposition (GJ EBP CVD) method. High-density oriented arrays of microropes of SiOx nanowires were obtained on c-Si and glass substrates and a copper substrate with a SiO2 barrier layer. The fabrication of the nanowires included three steps: heating the substrate with the tin catalyst film, hydrogen plasma treatment of it, and synthesis of the structures. Heating and hydrogen plasma treatment of the tin catalyst on c-Si and glass substrates leads to a decrease in the wetting of the substrate material by tin. As a result, the morphology of the tin catalyst particles changes from semi-elliptical to truncated spherical, which leads to a significant decrease in their surface density as a result of coalescence. A condition for obtaining a high-density oriented array of microropes of SiOx nanowires by the GJ EBP CVD method using a tin catalyst is the absence of chemical reaction between tin and the substrate material.",

keywords = "Chemical vapor deposition, Electron beam plasma, Silicon oxide nanowires, Tin catalyst, Vapor-liquid-solid mechanism, DEPOSITION, OPTICAL-PROPERTIES, EBP CVD METHOD, AMORPHOUS SIOX NANOWIRES, FILMS, TEMPERATURE, SPECTROSCOPY, GROWTH, JET",

author = "Zamchiy, {A. O.} and Baranov, {E. A.} and Khmel, {S. Ya}",

note = "Publisher Copyright: {\textcopyright} 2017 Elsevier Ltd",

year = "2018",

month = jan,

day = "1",

doi = "10.1016/j.vacuum.2017.10.028",

language = "English",

volume = "147",

pages = "99--106",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd",

}

RIS

TY - JOUR

T1 - Tin-catalyzed oriented array of microropes of silicon oxide nanowires synthesized on different substrates

AU - Zamchiy, A. O.

AU - Baranov, E. A.

AU - Khmel, S. Ya

PY - 2018/1/1

Y1 - 2018/1/1

N2 - Silicon oxide (SiOx) nanowires were synthesized from a monosilane–argon–hydrogen mixture on substrates of different materials (monocrystalline silicon (c-Si), glass, stainless steel, copper, and copper with a SiO2 barrier layer) coated with a tin catalyst film 60 nm thick using the gas-jet electron beam plasma chemical vapor deposition (GJ EBP CVD) method. High-density oriented arrays of microropes of SiOx nanowires were obtained on c-Si and glass substrates and a copper substrate with a SiO2 barrier layer. The fabrication of the nanowires included three steps: heating the substrate with the tin catalyst film, hydrogen plasma treatment of it, and synthesis of the structures. Heating and hydrogen plasma treatment of the tin catalyst on c-Si and glass substrates leads to a decrease in the wetting of the substrate material by tin. As a result, the morphology of the tin catalyst particles changes from semi-elliptical to truncated spherical, which leads to a significant decrease in their surface density as a result of coalescence. A condition for obtaining a high-density oriented array of microropes of SiOx nanowires by the GJ EBP CVD method using a tin catalyst is the absence of chemical reaction between tin and the substrate material.

AB - Silicon oxide (SiOx) nanowires were synthesized from a monosilane–argon–hydrogen mixture on substrates of different materials (monocrystalline silicon (c-Si), glass, stainless steel, copper, and copper with a SiO2 barrier layer) coated with a tin catalyst film 60 nm thick using the gas-jet electron beam plasma chemical vapor deposition (GJ EBP CVD) method. High-density oriented arrays of microropes of SiOx nanowires were obtained on c-Si and glass substrates and a copper substrate with a SiO2 barrier layer. The fabrication of the nanowires included three steps: heating the substrate with the tin catalyst film, hydrogen plasma treatment of it, and synthesis of the structures. Heating and hydrogen plasma treatment of the tin catalyst on c-Si and glass substrates leads to a decrease in the wetting of the substrate material by tin. As a result, the morphology of the tin catalyst particles changes from semi-elliptical to truncated spherical, which leads to a significant decrease in their surface density as a result of coalescence. A condition for obtaining a high-density oriented array of microropes of SiOx nanowires by the GJ EBP CVD method using a tin catalyst is the absence of chemical reaction between tin and the substrate material.

KW - Chemical vapor deposition

KW - Electron beam plasma

KW - Silicon oxide nanowires

KW - Tin catalyst

KW - Vapor-liquid-solid mechanism

KW - DEPOSITION

KW - OPTICAL-PROPERTIES

KW - EBP CVD METHOD

KW - AMORPHOUS SIOX NANOWIRES

KW - FILMS

KW - TEMPERATURE

KW - SPECTROSCOPY

KW - GROWTH

KW - JET

UR - http://www.scopus.com/inward/record.url?scp=85032207528&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2017.10.028

DO - 10.1016/j.vacuum.2017.10.028

M3 - Article

AN - SCOPUS:85032207528

VL - 147

SP - 99

EP - 106

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -

ID: 12099563