Original languageEnglish
Pages (from-to)99-106
Number of pages8
JournalVacuum
Volume147
DOIs
Publication statusPublished - 1 Jan 2018

    Research areas

  • Chemical vapor deposition, Electron beam plasma, Silicon oxide nanowires, Tin catalyst, Vapor-liquid-solid mechanism, DEPOSITION, OPTICAL-PROPERTIES, EBP CVD METHOD, AMORPHOUS SIOX NANOWIRES, FILMS, TEMPERATURE, SPECTROSCOPY, GROWTH, JET

    OECD FOS+WOS

ID: 12099563