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The effect of grains crystallographic orientations of copper substrate on graphene growth. / Kostogrud, I. A.; Boyko, E. V.

In: Journal of Physics: Conference Series, Vol. 1359, No. 1, 012102, 21.11.2019.

Research output: Contribution to journal › Conference article › peer-review

Harvard

Kostogrud, IA & Boyko, EV 2019, 'The effect of grains crystallographic orientations of copper substrate on graphene growth', Journal of Physics: Conference Series, vol. 1359, no. 1, 012102. https://doi.org/10.1088/1742-6596/1359/1/012102

APA

Kostogrud, I. A., & Boyko, E. V. (2019). The effect of grains crystallographic orientations of copper substrate on graphene growth. Journal of Physics: Conference Series, 1359(1), [012102]. https://doi.org/10.1088/1742-6596/1359/1/012102

Vancouver

Kostogrud IA, Boyko EV. The effect of grains crystallographic orientations of copper substrate on graphene growth. Journal of Physics: Conference Series. 2019 Nov 21;1359(1):012102. doi: 10.1088/1742-6596/1359/1/012102

Author

Kostogrud, I. A. ; Boyko, E. V. / The effect of grains crystallographic orientations of copper substrate on graphene growth. In: Journal of Physics: Conference Series. 2019 ; Vol. 1359, No. 1.

BibTeX

@article{de2aa734344e4c4f8c7c70dd526c6ff3,
title = "The effect of grains crystallographic orientations of copper substrate on graphene growth",
abstract = "The influence of orientation of copper crystal on the processes of methane decomposition and the growth of graphene layers is studied in this paper. It is shown that crystal nucleus growth rate and coating formation rate are different on copper grains with different crystal orientation. Maximum coating formation rates are recorded for 110 planes. Maximum crystal growth rate and maximum size of graphene single crystals in a film are observed for 100 plane. The difference in the growth rates of the graphene coating is explained by the difference in the kinetics of decomposition of methane and the diffusion rates on surfaces with different crystal orientation.",
keywords = "CHEMICAL-VAPOR-DEPOSITION",
author = "Kostogrud, {I. A.} and Boyko, {E. V.}",
year = "2019",
month = nov,
day = "21",
doi = "10.1088/1742-6596/1359/1/012102",
language = "English",
volume = "1359",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "1",
note = "4th All-Russian Scientific Conference Thermophysics and Physical Hydrodynamics with the School for Young Scientists, TPH 2019 ; Conference date: 15-09-2019 Through 22-09-2019",

}

RIS

TY - JOUR

T1 - The effect of grains crystallographic orientations of copper substrate on graphene growth

AU - Kostogrud, I. A.

AU - Boyko, E. V.

PY - 2019/11/21

Y1 - 2019/11/21

N2 - The influence of orientation of copper crystal on the processes of methane decomposition and the growth of graphene layers is studied in this paper. It is shown that crystal nucleus growth rate and coating formation rate are different on copper grains with different crystal orientation. Maximum coating formation rates are recorded for 110 planes. Maximum crystal growth rate and maximum size of graphene single crystals in a film are observed for 100 plane. The difference in the growth rates of the graphene coating is explained by the difference in the kinetics of decomposition of methane and the diffusion rates on surfaces with different crystal orientation.

AB - The influence of orientation of copper crystal on the processes of methane decomposition and the growth of graphene layers is studied in this paper. It is shown that crystal nucleus growth rate and coating formation rate are different on copper grains with different crystal orientation. Maximum coating formation rates are recorded for 110 planes. Maximum crystal growth rate and maximum size of graphene single crystals in a film are observed for 100 plane. The difference in the growth rates of the graphene coating is explained by the difference in the kinetics of decomposition of methane and the diffusion rates on surfaces with different crystal orientation.

KW - CHEMICAL-VAPOR-DEPOSITION

UR - http://www.scopus.com/inward/record.url?scp=85076474488&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1359/1/012102

DO - 10.1088/1742-6596/1359/1/012102

M3 - Conference article

AN - SCOPUS:85076474488

VL - 1359

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012102

T2 - 4th All-Russian Scientific Conference Thermophysics and Physical Hydrodynamics with the School for Young Scientists, TPH 2019

Y2 - 15 September 2019 through 22 September 2019

ER -

ID: 23054735