DOI

Original languageEnglish
Pages (from-to)818-822
Number of pages5
JournalSurface and Interface Analysis
Volume52
Issue number12
DOIs
Publication statusPublished - Dec 2020

    OECD FOS+WOS

  • 1.04 CHEMICAL SCIENCES

    Research areas

  • ceria, RF plasma sputtering, rhodium, Rh–CeO interaction, XPS, NO, RHODIUM, CO, Rh-CeO(2)interaction, SUPPORT, REDUCTION, CATALYTIC-PROPERTIES, REACTION PROBABILITY

ID: 25373183