Research output: Contribution to journal › Article › peer-review
Synthesis of Epitaxial Structures with Two-Dimensional Si Layers Embedded in a CaF2 Dielectric Matrix. / Zinovyev, V. A.; Zinovieva, A. F.; Volodin, V. A. et al.
In: JETP Letters, Vol. 116, No. 9, 11.2022, p. 628-633.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Synthesis of Epitaxial Structures with Two-Dimensional Si Layers Embedded in a CaF2 Dielectric Matrix
AU - Zinovyev, V. A.
AU - Zinovieva, A. F.
AU - Volodin, V. A.
AU - Gutakovskii, A. K.
AU - Deryabin, A. S.
AU - Krupin, A. Yu
AU - Kulik, L. V.
AU - Zhivulko, V. D.
AU - Mudryi, A. V.
AU - Dvurechenskii, A. V.
N1 - Publisher Copyright: © 2022, The Author(s).
PY - 2022/11
Y1 - 2022/11
N2 - The possibility of fabricating two-dimensional Si layers on a CaF2/Si(111) film by molecular beam epitaxy is studied. The growth conditions, under which the regions of two-dimensional Si layers are formed, are found. Raman spectroscopy, transmission electron microscopy, photoluminescence, and electron paramagnetic resonance (EPR) studies have shown that regions of two-dimensional Si layers are formed in epitaxial structures prepared by the deposition of one to three biatomic Si layers on the CaF2/Si(111) film surface at a temperature of 550°С. The Raman spectra of these structures exhibit a narrow peak at 418 cm–1, which is due to light scattering on vibrations of Si atoms in the plane of a two-dimensional Si layer intercalated with calcium. The EPR spectra of multilayer structures with regions of two-dimensional Si layers embedded in CaF2 demonstrate an isotropic signal with an asymmetric Dyson shape and the g-factor g = 1.9992 under illumination. Consequently, this signal can be attributed to photoinduced conduction electrons in extended two-dimensional Si islands. These results may be useful for understanding the mechanisms of the formation of two-dimensional materials on CaF2/Si(111) substrates.
AB - The possibility of fabricating two-dimensional Si layers on a CaF2/Si(111) film by molecular beam epitaxy is studied. The growth conditions, under which the regions of two-dimensional Si layers are formed, are found. Raman spectroscopy, transmission electron microscopy, photoluminescence, and electron paramagnetic resonance (EPR) studies have shown that regions of two-dimensional Si layers are formed in epitaxial structures prepared by the deposition of one to three biatomic Si layers on the CaF2/Si(111) film surface at a temperature of 550°С. The Raman spectra of these structures exhibit a narrow peak at 418 cm–1, which is due to light scattering on vibrations of Si atoms in the plane of a two-dimensional Si layer intercalated with calcium. The EPR spectra of multilayer structures with regions of two-dimensional Si layers embedded in CaF2 demonstrate an isotropic signal with an asymmetric Dyson shape and the g-factor g = 1.9992 under illumination. Consequently, this signal can be attributed to photoinduced conduction electrons in extended two-dimensional Si islands. These results may be useful for understanding the mechanisms of the formation of two-dimensional materials on CaF2/Si(111) substrates.
UR - http://www.scopus.com/inward/record.url?scp=85142434839&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/236dd1bb-e82e-3eaa-b8fe-08700a046ce5/
U2 - 10.1134/S0021364022602159
DO - 10.1134/S0021364022602159
M3 - Article
AN - SCOPUS:85142434839
VL - 116
SP - 628
EP - 633
JO - JETP Letters
JF - JETP Letters
SN - 0021-3640
IS - 9
ER -
ID: 39755882