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Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific kinetic energy on the sputter yield

Research output: Contribution to journal › Article › peer-review

Applied Physics Division

DOI

https://doi.org/10.1016/j.vacuum.2021.110188
Final published version

A. Tolstogouzov
P. Mazarov
A. E. Ieshkin
S. F. Belykh
N. G. Korobeishchikov
V. O. Pelenovich
D. J. Fu

Original language	English
Article number	110188
Journal	Vacuum
Volume	188
DOIs	https://doi.org/10.1016/j.vacuum.2021.110188
Publication status	Published - Jun 2021

Research areas

Bismuth, Liquid metal alloy ion source (LMAIS), Non-additive sputtering, Silicon, Sputter yield, Volume loss method

OECD FOS+WOS

2.05 MATERIALS ENGINEERING
1.03 PHYSICAL SCIENCES AND ASTRONOMY

ID: 28090268