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Silicon surface patterning by glow discharge plasma. / Petrova, A. V.; Bogoslovtseva, A. L.; Starinskiy, S. V. et al.

In: Journal of Applied Mechanics and Technical Physics, Vol. 64, No. 3, 06.2023, p. 472-477.

Research output: Contribution to journal › Article › peer-review

Harvard

Petrova, AV, Bogoslovtseva, AL, Starinskiy, SV & Safonov, AI 2023, 'Silicon surface patterning by glow discharge plasma', Journal of Applied Mechanics and Technical Physics, vol. 64, no. 3, pp. 472-477. https://doi.org/10.1134/S0021894423030136

APA

Petrova, A. V., Bogoslovtseva, A. L., Starinskiy, S. V., & Safonov, A. I. (2023). Silicon surface patterning by glow discharge plasma. Journal of Applied Mechanics and Technical Physics, 64(3), 472-477. https://doi.org/10.1134/S0021894423030136

Vancouver

Petrova AV, Bogoslovtseva AL, Starinskiy SV, Safonov AI. Silicon surface patterning by glow discharge plasma. Journal of Applied Mechanics and Technical Physics. 2023 Jun;64(3):472-477. doi: 10.1134/S0021894423030136

Author

Petrova, A. V. ; Bogoslovtseva, A. L. ; Starinskiy, S. V. et al. / Silicon surface patterning by glow discharge plasma. In: Journal of Applied Mechanics and Technical Physics. 2023 ; Vol. 64, No. 3. pp. 472-477.

BibTeX

@article{71488a87ed6e4ffe8f9c93f448a566f9,
title = "Silicon surface patterning by glow discharge plasma",
abstract = "The possibility of changing the silicon surface morphology at certain glow discharge parameters is shown. It is established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated parameter range, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer and the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.",
keywords = "glow discharge, hydrophilicity, oxidation, silicon processing, wettability",
author = "Petrova, {A. V.} and Bogoslovtseva, {A. L.} and Starinskiy, {S. V.} and Safonov, {A. I.}",
note = "This work was financially supported by the Russian Science Foundation (Grant No. 18-79-1011). Публикация для корректировки.",
year = "2023",
month = jun,
doi = "10.1134/S0021894423030136",
language = "English",
volume = "64",
pages = "472--477",
journal = "Journal of Applied Mechanics and Technical Physics",
issn = "0021-8944",
publisher = "Maik Nauka-Interperiodica Publishing",
number = "3",

}

RIS

TY - JOUR

T1 - Silicon surface patterning by glow discharge plasma

AU - Petrova, A. V.

AU - Bogoslovtseva, A. L.

AU - Starinskiy, S. V.

AU - Safonov, A. I.

N1 - This work was financially supported by the Russian Science Foundation (Grant No. 18-79-1011). Публикация для корректировки.

PY - 2023/6

Y1 - 2023/6

N2 - The possibility of changing the silicon surface morphology at certain glow discharge parameters is shown. It is established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated parameter range, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer and the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.

AB - The possibility of changing the silicon surface morphology at certain glow discharge parameters is shown. It is established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated parameter range, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer and the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.

KW - glow discharge

KW - hydrophilicity

KW - oxidation

KW - silicon processing

KW - wettability

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85168424009&origin=inward&txGid=73ca6df595f834a2735cc50343658a84

UR - https://www.mendeley.com/catalogue/b8122357-179c-353b-9db9-a0b69a107789/

U2 - 10.1134/S0021894423030136

DO - 10.1134/S0021894423030136

M3 - Article

VL - 64

SP - 472

EP - 477

JO - Journal of Applied Mechanics and Technical Physics

JF - Journal of Applied Mechanics and Technical Physics

SN - 0021-8944

IS - 3

ER -

ID: 59618401