Review of Surface Modification Technologies for Mid-Infrared Antireflection Microstructures Fabrication

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Review of Surface Modification Technologies for Mid-Infrared Antireflection Microstructures Fabrication. / Bushunov, Andrey A.; Tarabrin, Mikhail K.; Lazarev, Vladimir A.

In: Laser and Photonics Reviews, Vol. 15, No. 5, 2000202, 05.2021.

Research output: Contribution to journal › Review article › peer-review

BibTeX

@article{cced70bdf7b248dfbc176091172dc9ee,

title = "Review of Surface Modification Technologies for Mid-Infrared Antireflection Microstructures Fabrication",

abstract = "Mid-infrared materials antireflection is in high demand for high-powered or ultra-broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid-infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser-induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 (Formula presented.) m range.",

keywords = "antireflection, colloids, etching, laser ablation, lithography, microstructures, mid–infrared, nanostructures",

author = "Bushunov, {Andrey A.} and Tarabrin, {Mikhail K.} and Lazarev, {Vladimir A.}",

note = "Funding Information: The authors acknowledge the financial support of Russian Science Foundation (project No. 20‐72‐10027). Publisher Copyright: {\textcopyright} 2021 Wiley-VCH GmbH Copyright: Copyright 2021 Elsevier B.V., All rights reserved.",

year = "2021",

month = may,

doi = "10.1002/lpor.202000202",

language = "English",

volume = "15",

journal = "Laser and Photonics Reviews",

issn = "1863-8880",

publisher = "WILEY-V C H VERLAG GMBH",

number = "5",

}

RIS

TY - JOUR

T1 - Review of Surface Modification Technologies for Mid-Infrared Antireflection Microstructures Fabrication

AU - Bushunov, Andrey A.

AU - Tarabrin, Mikhail K.

AU - Lazarev, Vladimir A.

N1 - Funding Information: The authors acknowledge the financial support of Russian Science Foundation (project No. 20‐72‐10027). Publisher Copyright: © 2021 Wiley-VCH GmbH Copyright: Copyright 2021 Elsevier B.V., All rights reserved.

PY - 2021/5

Y1 - 2021/5

N2 - Mid-infrared materials antireflection is in high demand for high-powered or ultra-broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid-infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser-induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 (Formula presented.) m range.

AB - Mid-infrared materials antireflection is in high demand for high-powered or ultra-broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid-infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser-induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 (Formula presented.) m range.

KW - antireflection

KW - colloids

KW - etching

KW - laser ablation

KW - lithography

KW - microstructures

KW - mid–infrared

KW - nanostructures

UR - http://www.scopus.com/inward/record.url?scp=85102656544&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/02afaa4d-ef0b-3e32-a2fc-d9f106abd6c3/

U2 - 10.1002/lpor.202000202

DO - 10.1002/lpor.202000202

M3 - Review article

AN - SCOPUS:85102656544

VL - 15

JO - Laser and Photonics Reviews

JF - Laser and Photonics Reviews

SN - 1863-8880

IS - 5

M1 - 2000202

ER -

ID: 28133949