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Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers. / Tyschenko, I. E.; Volodin, V. A.; Cherkov, A. G. et al.

In: Journal of Luminescence, Vol. 204, 01.12.2018, p. 656-662.

Research output: Contribution to journalArticlepeer-review

Harvard

Tyschenko, IE, Volodin, VA, Cherkov, AG, Stoffel, M, Rinnert, H, Vergnat, M & Popov, VP 2018, 'Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers', Journal of Luminescence, vol. 204, pp. 656-662. https://doi.org/10.1016/j.jlumin.2018.08.057

APA

Tyschenko, I. E., Volodin, V. A., Cherkov, A. G., Stoffel, M., Rinnert, H., Vergnat, M., & Popov, V. P. (2018). Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers. Journal of Luminescence, 204, 656-662. https://doi.org/10.1016/j.jlumin.2018.08.057

Vancouver

Tyschenko IE, Volodin VA, Cherkov AG, Stoffel M, Rinnert H, Vergnat M et al. Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers. Journal of Luminescence. 2018 Dec 1;204:656-662. doi: 10.1016/j.jlumin.2018.08.057

Author

Tyschenko, I. E. ; Volodin, V. A. ; Cherkov, A. G. et al. / Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers. In: Journal of Luminescence. 2018 ; Vol. 204. pp. 656-662.

BibTeX

@article{56671dab0d7244da952ba9294fb6465d,
title = "Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers",
abstract = "The InSb nanocrystals embedded in buried SiO2 layers were obtained by the In+ and Sb+ ion implantation into the SiO2 layers thermally grown on Si wafers followed by the hydrogen transfer of a Si film and high-temperature annealing at 800–1100 °C. Transmission electron microscopy, Raman spectroscopy and photoluminescence were used to study the sample properties. The spherical-shaped InSb nanocrystals distributed close to the implanted atom profiles were obtained in buried SiO2. The InSb TO- and LO-like phonon modes at 187 cm−1 and 195 cm−1 were observed in the Raman spectra. The effect of both phonon quantum confinement and stresses on the phonon frequency shift was calculated. The TO-LO splitting obtained from the ion-beam synthesized InSb nanocrystals was 3 cm−1 less than that from the unstressed bulk monocrystalline InSb. The obtained effect is discussed in the frames of decreasing the transverse effective charge, as well as that of the surface phonon influence. The photoluminescence peak at 1524 nm (0.81 eV) was seen in the low-temperature PL spectra from the samples annealed at 900–1000 °C. Its energy position corresponds to the localized charge carrier energy in the InSb nanocrystals.",
keywords = "InSb, Ion implantation, Nanocrystals, Photoluminescence, Raman scattering, Silicon-on-insulator, FREQUENCIES, QUANTUM-DOTS, SEMICONDUCTORS, SILICON, GASB, DEPENDENCE, PRESSURE, III-V, ABSORPTION, SCATTERING",
author = "Tyschenko, {I. E.} and Volodin, {V. A.} and Cherkov, {A. G.} and M. Stoffel and H. Rinnert and M. Vergnat and Popov, {V. P.}",
year = "2018",
month = dec,
day = "1",
doi = "10.1016/j.jlumin.2018.08.057",
language = "English",
volume = "204",
pages = "656--662",
journal = "Journal of Luminescence",
issn = "0022-2313",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Raman shifts and photoluminescence of the InSb nanocrystals ion beam-synthesized in buried SiO2 layers

AU - Tyschenko, I. E.

AU - Volodin, V. A.

AU - Cherkov, A. G.

AU - Stoffel, M.

AU - Rinnert, H.

AU - Vergnat, M.

AU - Popov, V. P.

PY - 2018/12/1

Y1 - 2018/12/1

N2 - The InSb nanocrystals embedded in buried SiO2 layers were obtained by the In+ and Sb+ ion implantation into the SiO2 layers thermally grown on Si wafers followed by the hydrogen transfer of a Si film and high-temperature annealing at 800–1100 °C. Transmission electron microscopy, Raman spectroscopy and photoluminescence were used to study the sample properties. The spherical-shaped InSb nanocrystals distributed close to the implanted atom profiles were obtained in buried SiO2. The InSb TO- and LO-like phonon modes at 187 cm−1 and 195 cm−1 were observed in the Raman spectra. The effect of both phonon quantum confinement and stresses on the phonon frequency shift was calculated. The TO-LO splitting obtained from the ion-beam synthesized InSb nanocrystals was 3 cm−1 less than that from the unstressed bulk monocrystalline InSb. The obtained effect is discussed in the frames of decreasing the transverse effective charge, as well as that of the surface phonon influence. The photoluminescence peak at 1524 nm (0.81 eV) was seen in the low-temperature PL spectra from the samples annealed at 900–1000 °C. Its energy position corresponds to the localized charge carrier energy in the InSb nanocrystals.

AB - The InSb nanocrystals embedded in buried SiO2 layers were obtained by the In+ and Sb+ ion implantation into the SiO2 layers thermally grown on Si wafers followed by the hydrogen transfer of a Si film and high-temperature annealing at 800–1100 °C. Transmission electron microscopy, Raman spectroscopy and photoluminescence were used to study the sample properties. The spherical-shaped InSb nanocrystals distributed close to the implanted atom profiles were obtained in buried SiO2. The InSb TO- and LO-like phonon modes at 187 cm−1 and 195 cm−1 were observed in the Raman spectra. The effect of both phonon quantum confinement and stresses on the phonon frequency shift was calculated. The TO-LO splitting obtained from the ion-beam synthesized InSb nanocrystals was 3 cm−1 less than that from the unstressed bulk monocrystalline InSb. The obtained effect is discussed in the frames of decreasing the transverse effective charge, as well as that of the surface phonon influence. The photoluminescence peak at 1524 nm (0.81 eV) was seen in the low-temperature PL spectra from the samples annealed at 900–1000 °C. Its energy position corresponds to the localized charge carrier energy in the InSb nanocrystals.

KW - InSb

KW - Ion implantation

KW - Nanocrystals

KW - Photoluminescence

KW - Raman scattering

KW - Silicon-on-insulator

KW - FREQUENCIES

KW - QUANTUM-DOTS

KW - SEMICONDUCTORS

KW - SILICON

KW - GASB

KW - DEPENDENCE

KW - PRESSURE

KW - III-V

KW - ABSORPTION

KW - SCATTERING

UR - http://www.scopus.com/inward/record.url?scp=85052858815&partnerID=8YFLogxK

U2 - 10.1016/j.jlumin.2018.08.057

DO - 10.1016/j.jlumin.2018.08.057

M3 - Article

AN - SCOPUS:85052858815

VL - 204

SP - 656

EP - 662

JO - Journal of Luminescence

JF - Journal of Luminescence

SN - 0022-2313

ER -

ID: 16484793