Standard

Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances. / Chepkasov, S.; Zolkin, A.; Piliptsou, D. et al.

In: Journal of Physics: Conference Series, Vol. 1115, No. 3, 032066, 27.11.2018.

Research output: Contribution to journal › Conference article › peer-review

Harvard

Chepkasov, S, Zolkin, A, Piliptsou, D, Gladkikh, E & Kravchuk, K 2018, 'Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances', Journal of Physics: Conference Series, vol. 1115, no. 3, 032066. https://doi.org/10.1088/1742-6596/1115/3/032066

APA

Chepkasov, S., Zolkin, A., Piliptsou, D., Gladkikh, E., & Kravchuk, K. (2018). Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances. Journal of Physics: Conference Series, 1115(3), [032066]. https://doi.org/10.1088/1742-6596/1115/3/032066

Vancouver

Chepkasov S, Zolkin A, Piliptsou D, Gladkikh E, Kravchuk K. Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances. Journal of Physics: Conference Series. 2018 Nov 27;1115(3):032066. doi: 10.1088/1742-6596/1115/3/032066

Author

Chepkasov, S. ; Zolkin, A. ; Piliptsou, D. et al. / Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances. In: Journal of Physics: Conference Series. 2018 ; Vol. 1115, No. 3.

BibTeX

@article{1c4f0efcb68e433da8c0e6c932990143,
title = "Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances",
abstract = "Tetrahedral amorphous carbon (ta-C) coatings have been prepared on silicon substrates by the pulsed cathodic arc source. For the limitation of the heat flux of the carbon plasma to the sample, the diaphragm of 27 mm diameter has been used. The deposition process has been carried out at three different distances between the arc source and the substrate: 150, 215 and 265 mm. The properties of ta-C coatings have been studied by Raman spectroscopy and dynamic nanoindentation techniques. The analysis of Raman spectra parameters has revealed that the concentration of ordered aromatic rings in Csp2 cluster decreases with distance between the arc source and the substrate while the concentration of chain groups increases. Nanoindentation has shown the decrease in nanohardness and Young's modulus with the distance. Nanohardness value falls from 21 GPa to 16 GPa and Young's modulus value goes down from 197 GPa to 177 GPa. So, it's possible to control the formation of ta-C coatings structure by changing distance between the pulsed cathodic arc source and the substrate.",
author = "S. Chepkasov and A. Zolkin and D. Piliptsou and E. Gladkikh and K. Kravchuk",
year = "2018",
month = nov,
day = "27",
doi = "10.1088/1742-6596/1115/3/032066",
language = "English",
volume = "1115",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "3",
note = "6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 ; Conference date: 16-09-2018 Through 22-09-2018",

}

RIS

TY - JOUR

T1 - Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances

AU - Chepkasov, S.

AU - Zolkin, A.

AU - Piliptsou, D.

AU - Gladkikh, E.

AU - Kravchuk, K.

PY - 2018/11/27

Y1 - 2018/11/27

N2 - Tetrahedral amorphous carbon (ta-C) coatings have been prepared on silicon substrates by the pulsed cathodic arc source. For the limitation of the heat flux of the carbon plasma to the sample, the diaphragm of 27 mm diameter has been used. The deposition process has been carried out at three different distances between the arc source and the substrate: 150, 215 and 265 mm. The properties of ta-C coatings have been studied by Raman spectroscopy and dynamic nanoindentation techniques. The analysis of Raman spectra parameters has revealed that the concentration of ordered aromatic rings in Csp2 cluster decreases with distance between the arc source and the substrate while the concentration of chain groups increases. Nanoindentation has shown the decrease in nanohardness and Young's modulus with the distance. Nanohardness value falls from 21 GPa to 16 GPa and Young's modulus value goes down from 197 GPa to 177 GPa. So, it's possible to control the formation of ta-C coatings structure by changing distance between the pulsed cathodic arc source and the substrate.

AB - Tetrahedral amorphous carbon (ta-C) coatings have been prepared on silicon substrates by the pulsed cathodic arc source. For the limitation of the heat flux of the carbon plasma to the sample, the diaphragm of 27 mm diameter has been used. The deposition process has been carried out at three different distances between the arc source and the substrate: 150, 215 and 265 mm. The properties of ta-C coatings have been studied by Raman spectroscopy and dynamic nanoindentation techniques. The analysis of Raman spectra parameters has revealed that the concentration of ordered aromatic rings in Csp2 cluster decreases with distance between the arc source and the substrate while the concentration of chain groups increases. Nanoindentation has shown the decrease in nanohardness and Young's modulus with the distance. Nanohardness value falls from 21 GPa to 16 GPa and Young's modulus value goes down from 197 GPa to 177 GPa. So, it's possible to control the formation of ta-C coatings structure by changing distance between the pulsed cathodic arc source and the substrate.

UR - http://www.scopus.com/inward/record.url?scp=85058240930&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1115/3/032066

DO - 10.1088/1742-6596/1115/3/032066

M3 - Conference article

AN - SCOPUS:85058240930

VL - 1115

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 3

M1 - 032066

T2 - 6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018

Y2 - 16 September 2018 through 22 September 2018

ER -

ID: 17853449