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Preparation and surface nanostructural characterization of multi-emitter sources based on superionic conductor CsAg4Br3-xI2+x (x=0.25). / Abudouwufu, Tushagu; Tolstoguzov, A. B.; Коробейщиков, Николай Геннадьевич et al.

In: Vacuum, Vol. 221, 112929, 03.2024.

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@article{8df0aa07131a484e813d7c7c43dc43f4,
title = "Preparation and surface nanostructural characterization of multi-emitter sources based on superionic conductor CsAg4Br3-xI2+x (x=0.25)",
abstract = "Since the fabrication of micro-/nano-electronic devices is approaching nanoscales and demanding low energy, high dose ion beam processing with controlled area and dense patterns to meet the current semiconductor industry demands, continuous advancement is needed in terms of material design and ion beam techniques. In this perspective, development of new ion sources may provide advanced technologies useful in the manufacture of high-performance devices. Silver ion beams have salient features including simple generating process, nanoscale beam spot size and high intensity ion current. In this paper, we have developed a solid electrolyte multi emitter ion source (SEIS) with CsAg4Br3-xI2+x (x = 0.25) films deposited on silver tips. Ag+ ion emission is significantly enhanced with the added number of emitters and the ion current of 1.95 μA (with four emitter tips) has been obtained at 168 °C temperature and 20 kV accelerating voltage. The stability and cooling/heating curves of the multi-emitter ion beam are measured, and the interrelation between ion current intensity and mechanism of shape geometry of the emitter tips are discussed. Finally, both the solid electrolyte multi-tip emitters and the collector surfaces are analyzed, with an attempt to precisely control of formation of the nanoparticles (NPs) including their size and height through the control of the ion implantation parameters.",
author = "Tushagu Abudouwufu and Tolstoguzov, {A. B.} and Коробейщиков, {Николай Геннадьевич} and Dejin Fu",
note = "This work was supported by the National Natural Science Foundation of China under grant Nos. 12375285, 12305328, the China Postdoctoral Science Foundation No. 2022M722439, and the Science and Technology Planning Project of Shenzhen Municipality No. JCYJ20220530140605011. We thank Dr. Nenad Bundaleski from the Departamento de F{\'i}sica da Faculdade de Ci{\^e}ncias e Tecnologia, Universidade Nova de Lisboa (Caparica, Portugal) for his valuable assistance in an interpretation of our XPS data. Публикация для корректировки.",
year = "2024",
month = mar,
doi = "10.1016/j.vacuum.2023.112929",
language = "English",
volume = "221",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Ltd",

}

RIS

TY - JOUR

T1 - Preparation and surface nanostructural characterization of multi-emitter sources based on superionic conductor CsAg4Br3-xI2+x (x=0.25)

AU - Abudouwufu, Tushagu

AU - Tolstoguzov, A. B.

AU - Коробейщиков, Николай Геннадьевич

AU - Fu, Dejin

N1 - This work was supported by the National Natural Science Foundation of China under grant Nos. 12375285, 12305328, the China Postdoctoral Science Foundation No. 2022M722439, and the Science and Technology Planning Project of Shenzhen Municipality No. JCYJ20220530140605011. We thank Dr. Nenad Bundaleski from the Departamento de Física da Faculdade de Ciências e Tecnologia, Universidade Nova de Lisboa (Caparica, Portugal) for his valuable assistance in an interpretation of our XPS data. Публикация для корректировки.

PY - 2024/3

Y1 - 2024/3

N2 - Since the fabrication of micro-/nano-electronic devices is approaching nanoscales and demanding low energy, high dose ion beam processing with controlled area and dense patterns to meet the current semiconductor industry demands, continuous advancement is needed in terms of material design and ion beam techniques. In this perspective, development of new ion sources may provide advanced technologies useful in the manufacture of high-performance devices. Silver ion beams have salient features including simple generating process, nanoscale beam spot size and high intensity ion current. In this paper, we have developed a solid electrolyte multi emitter ion source (SEIS) with CsAg4Br3-xI2+x (x = 0.25) films deposited on silver tips. Ag+ ion emission is significantly enhanced with the added number of emitters and the ion current of 1.95 μA (with four emitter tips) has been obtained at 168 °C temperature and 20 kV accelerating voltage. The stability and cooling/heating curves of the multi-emitter ion beam are measured, and the interrelation between ion current intensity and mechanism of shape geometry of the emitter tips are discussed. Finally, both the solid electrolyte multi-tip emitters and the collector surfaces are analyzed, with an attempt to precisely control of formation of the nanoparticles (NPs) including their size and height through the control of the ion implantation parameters.

AB - Since the fabrication of micro-/nano-electronic devices is approaching nanoscales and demanding low energy, high dose ion beam processing with controlled area and dense patterns to meet the current semiconductor industry demands, continuous advancement is needed in terms of material design and ion beam techniques. In this perspective, development of new ion sources may provide advanced technologies useful in the manufacture of high-performance devices. Silver ion beams have salient features including simple generating process, nanoscale beam spot size and high intensity ion current. In this paper, we have developed a solid electrolyte multi emitter ion source (SEIS) with CsAg4Br3-xI2+x (x = 0.25) films deposited on silver tips. Ag+ ion emission is significantly enhanced with the added number of emitters and the ion current of 1.95 μA (with four emitter tips) has been obtained at 168 °C temperature and 20 kV accelerating voltage. The stability and cooling/heating curves of the multi-emitter ion beam are measured, and the interrelation between ion current intensity and mechanism of shape geometry of the emitter tips are discussed. Finally, both the solid electrolyte multi-tip emitters and the collector surfaces are analyzed, with an attempt to precisely control of formation of the nanoparticles (NPs) including their size and height through the control of the ion implantation parameters.

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85180966524&origin=inward&txGid=e20265f58c87718255298fd2998672b2

UR - https://www.mendeley.com/catalogue/11bbae7a-61b4-35da-b78a-b12c1dd1d858/

U2 - 10.1016/j.vacuum.2023.112929

DO - 10.1016/j.vacuum.2023.112929

M3 - Article

VL - 221

JO - Vacuum

JF - Vacuum

SN - 0042-207X

M1 - 112929

ER -

ID: 59390605