Original languageEnglish
Pages (from-to)11402-11405
Number of pages4
JournalMaterials Today: Proceedings
Volume4
Issue number11
DOIs
Publication statusPublished - 2017

    OECD FOS+WOS

    Research areas

  • hydrogenated amorphous silicon, pulse annealing, Raman scattering, Silicon nanocrystals, silicon nitride, silicon oxide, CRYSTALLIZATION, SILICON FILMS, SPECTROSCOPY

ID: 9047798