DOI

  • Arvind Mukundan
  • Shih Wei Feng
  • Yu Hsin Weng
  • Yu Ming Tsao
  • Sofya B. Artemkina
  • Vladimir E. Fedorov
  • Yen Sheng Lin
  • Yu Cheng Huang
  • Hsiang Chen Wang
Original languageEnglish
Article number4745
JournalInternational Journal of Molecular Sciences
Volume23
Issue number9
DOIs
Publication statusPublished - 1 May 2022

    OECD FOS+WOS

  • 2.04 CHEMICAL ENGINEERING
  • 1.04 CHEMICAL SCIENCES
  • 1.06 BIOLOGICAL SCIENCES

    Research areas

  • biosensor, chemical vapor deposition, cuprous oxide (Cu2O), DNA, molybdenum disulfide (MoS2), photoelectrochemical, positive oxide trap state

ID: 36028806