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Method for Manufacturing Silicon X-Ray Masks Via Plasma Chemical Etching

Research output: Contribution to journal › Article › peer-review

Quantum Phenomena in Condensed Systems Laboratory

DOI

https://doi.org/10.1134/S1027451020040266
Final published version

A. N. Gentselev
F. N. Dultsev
B. G. Goldenberg
K. E. Kuper

Original language	English
Pages (from-to)	862-865
Number of pages	4
Journal	Journal of Surface Investigation
Volume	14
Issue number	4
DOIs	https://doi.org/10.1134/S1027451020040266
Publication status	Published - 1 Jul 2020

OECD FOS+WOS

Research areas

deep X-ray lithography, LIGA technology, X-ray masks, LITHOGRAPHY

ID: 25309432