Large-scale and localized laser crystallization of optically thick amorphous silicon films by near-IR femtosecond pulses › Research Explorer

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Large-scale and localized laser crystallization of optically thick amorphous silicon films by near-IR femtosecond pulses

Research output: Contribution to journal › Article › peer-review

DOI

https://doi.org/10.3390/ma13225296
Final published version

Kirill Bronnikov
Alexander Dostovalov
Artem Cherepakhin
Eugeny Mitsai
Alexander Nepomniaschiy
Sergei A. Kulinich
Alexey Zhizhchenko
Aleksandr Kuchmizhak

Original language	English
Article number	5296
Pages (from-to)	1-10
Number of pages	10
Journal	Materials
Volume	13
Issue number	22
DOIs	https://doi.org/10.3390/ma13225296
Publication status	Published - 2 Nov 2020

OECD FOS+WOS

Research areas

Amorphous silicon, Femtosecond laser pulses, Laser-induced annealing, Polycrystalline silicon, Raman spectroscopy, Thin films, amorphous silicon, laser-induced annealing, SOLAR-CELLS, femtosecond laser pulses, polycrystalline silicon, thin films, GLASS, SI

ID: 26082215