Standard

Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition. / Baranova, L. V.; Strunin, V. I.; Chirikov, N. A.

In: Journal of Physics: Conference Series, Vol. 1870, No. 1, 012023, 19.04.2021.

Research output: Contribution to journal › Conference article › peer-review

Harvard

Baranova, LV, Strunin, VI & Chirikov, NA 2021, 'Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition', Journal of Physics: Conference Series, vol. 1870, no. 1, 012023. https://doi.org/10.1088/1742-6596/1870/1/012023

APA

Baranova, L. V., Strunin, V. I., & Chirikov, N. A. (2021). Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition. Journal of Physics: Conference Series, 1870(1), [012023]. https://doi.org/10.1088/1742-6596/1870/1/012023

Vancouver

Baranova LV, Strunin VI, Chirikov NA. Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition. Journal of Physics: Conference Series. 2021 Apr 19;1870(1):012023. doi: 10.1088/1742-6596/1870/1/012023

Author

Baranova, L. V. ; Strunin, V. I. ; Chirikov, N. A. / Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition. In: Journal of Physics: Conference Series. 2021 ; Vol. 1870, No. 1.

BibTeX

@article{0ba1f609ff0746f88d929f7ded5a6aa1,
title = "Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition",
abstract = "To ensure the optimal combination of the properties of the thin-film layers of piezoelectric structures and achieve the required characteristics of resonators and devices for selecting and generating of the signals based on them, the influence of technological modes of aluminum nitride films formation on the surface morphology, structure and elemental composition of films used in the construction of microelectronic bulk acoustic waves (BAW) resonator with Bragg reflector, the optimal modes are determined that satisfy the requirements for film layers for a piezoelectric transducer and Bragg reflector. ",
keywords = "elemental composition, film surface morphology, magnetron sputtering, scanning electron microscopy",
author = "Baranova, {L. V.} and Strunin, {V. I.} and Chirikov, {N. A.}",
note = "Funding Information: The work was carried out within the framework of the state assignment of the Omsk Scientific Center of the SB RAS following the Program of the Federal Research Institute of the Russian Academy of Sciences for 2013-2020 (project AAAA-A19-119052890058-2). Publisher Copyright: {\textcopyright} Published under licence by IOP Publishing Ltd. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.; 1st All-Russian Conference with International Participation on Gas Discharge Plasma and Synthesis of Nanostructures, GDP_NANO 2020 ; Conference date: 02-12-2020 Through 05-12-2020",
year = "2021",
month = apr,
day = "19",
doi = "10.1088/1742-6596/1870/1/012023",
language = "English",
volume = "1870",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "1",

}

RIS

TY - JOUR

T1 - Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition

AU - Baranova, L. V.

AU - Strunin, V. I.

AU - Chirikov, N. A.

N1 - Conference code: 1

PY - 2021/4/19

Y1 - 2021/4/19

N2 - To ensure the optimal combination of the properties of the thin-film layers of piezoelectric structures and achieve the required characteristics of resonators and devices for selecting and generating of the signals based on them, the influence of technological modes of aluminum nitride films formation on the surface morphology, structure and elemental composition of films used in the construction of microelectronic bulk acoustic waves (BAW) resonator with Bragg reflector, the optimal modes are determined that satisfy the requirements for film layers for a piezoelectric transducer and Bragg reflector.

AB - To ensure the optimal combination of the properties of the thin-film layers of piezoelectric structures and achieve the required characteristics of resonators and devices for selecting and generating of the signals based on them, the influence of technological modes of aluminum nitride films formation on the surface morphology, structure and elemental composition of films used in the construction of microelectronic bulk acoustic waves (BAW) resonator with Bragg reflector, the optimal modes are determined that satisfy the requirements for film layers for a piezoelectric transducer and Bragg reflector.

KW - elemental composition

KW - film surface morphology

KW - magnetron sputtering

KW - scanning electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=85104836146&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1870/1/012023

DO - 10.1088/1742-6596/1870/1/012023

M3 - Conference article

AN - SCOPUS:85104836146

VL - 1870

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012023

T2 - 1st All-Russian Conference with International Participation on Gas Discharge Plasma and Synthesis of Nanostructures

Y2 - 2 December 2020 through 5 December 2020

ER -

ID: 28471328