DOI

  • Konstantin V. Egorov
  • Dmitry S. Kuzmichev
  • Andrey A. Sigarev
  • Denis I. Myakota
  • Sergey S. Zarubin
  • Pavel S. Chizov
  • Timofey V. Perevalov
  • Vladimir A. Gritsenko
  • Cheol Seong Hwang
  • Andrey M. Markeev
Original languageEnglish
Pages (from-to)9667-9674
Number of pages8
JournalJournal of Materials Chemistry C
Volume6
Issue number36
DOIs
Publication statusPublished - 28 Sept 2018

    OECD FOS+WOS

    Research areas

  • OXIDE THIN-FILMS, TANTALUM OXIDE, TA(OC2H5)(5), GROWTH, ALD

ID: 16703541