DOI

Original languageEnglish
Pages (from-to)757-764
Number of pages8
JournalJournal of Applied Mechanics and Technical Physics
Volume63
Issue number5
DOIs
Publication statusPublished - 6 Feb 2023

    Research areas

  • nanocrystalline silicon, nonstoichiometric silicon oxide, thin film synthesis

    OECD FOS+WOS

  • 2.03.PU MECHANICS

ID: 68321825