Formation of two-dimensional photonic crystals by electron-beam lithography. / Utkin, Dmitry E.; Nasimov, Dmitry A.
12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings. 2011. p. 119-121 6006911 (12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Research › peer-review
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TY - GEN
T1 - Formation of two-dimensional photonic crystals by electron-beam lithography
AU - Utkin, Dmitry E.
AU - Nasimov, Dmitry A.
PY - 2011
Y1 - 2011
N2 - The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.
AB - The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.
KW - lithography
KW - Photonic crystal
KW - Proximity effect
UR - http://www.scopus.com/inward/record.url?scp=80052837465&partnerID=8YFLogxK
U2 - 10.1109/EDM.2011.6006911
DO - 10.1109/EDM.2011.6006911
M3 - Conference contribution
AN - SCOPUS:80052837465
SN - 9781612847955
T3 - 12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings
SP - 119
EP - 121
BT - 12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings
T2 - 12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011
Y2 - 30 June 2011 through 4 July 2011
ER -
ID: 25602383