Formation of Thick High-Aspect-Ratio Resistive Masks by the Contact Photolithography Method

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	127-134
Number of pages	8
Journal	Optoelectronics, Instrumentation and Data Processing
Volume	54
Issue number	2
DOIs	https://doi.org/10.3103/S8756699018020024
Publication status	Published - 1 Mar 2018

contact photolithography device, deep contact photolithography, LIGA masks, stamp or cast mould microrelief, SU-8 resist

ID: 13925113