Femtosecond Laser Crystallization of Ultrathin a-Ge Films in Multilayer Stacks with Silicon Layers › Research Explorer

Links

https://www.mdpi.com/2076-3417/15/20/11082

DOI

https://doi.org/10.3390/app152011082
Final published version

Yuzhu Cheng
Alexander v. Bulgakov
Nadezhda m. Bulgakova
Jiří Beránek
Aleksey v. Kacyuba
Vladimir a. Volodin

Original language	English
Pages (from-to)	11082
Journal	Applied Sciences
Volume	15
Issue number	20
DOIs	https://doi.org/10.3390/app152011082
Publication status	Published - 16 Oct 2025

OECD FOS+WOS

2.03 MECHANICAL ENGINEERING

Research areas

silicon–germanium multilayer structures, ultrathin films, femtosecond laser annealing, selective crystallization, stress confinement, Raman spectroscopy

ID: 71765897