Research output: Contribution to journal › Article › peer-review
Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography. / Gentselev, A. N.; Kuznetsov, S. A.; Baev, S. G. et al.
In: Journal of Surface Investigation, Vol. 11, No. 4, 01.07.2017, p. 710-720.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography
AU - Gentselev, A. N.
AU - Kuznetsov, S. A.
AU - Baev, S. G.
AU - Goldenberg, B. G.
AU - Lonshakov, E. A.
N1 - Publisher Copyright: © 2017, Pleiades Publishing, Ltd.
PY - 2017/7/1
Y1 - 2017/7/1
N2 - A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.
AB - A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.
KW - deep X-ray lithography
KW - high-pass filter
KW - laser microtreatment (cutting)
KW - planar lens
KW - pseudometallic structure
KW - synchrotron radiation
KW - terahertz radiation
KW - X-ray mask
UR - http://www.scopus.com/inward/record.url?scp=85028038211&partnerID=8YFLogxK
U2 - 10.1134/S1027451017040073
DO - 10.1134/S1027451017040073
M3 - Article
AN - SCOPUS:85028038211
VL - 11
SP - 710
EP - 720
JO - Journal of Surface Investigation
JF - Journal of Surface Investigation
SN - 1027-4510
IS - 4
ER -
ID: 8679039