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Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography. / Gentselev, A. N.; Kuznetsov, S. A.; Baev, S. G. et al.

In: Journal of Surface Investigation, Vol. 11, No. 4, 01.07.2017, p. 710-720.

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Gentselev AN, Kuznetsov SA, Baev SG, Goldenberg BG, Lonshakov EA. Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography. Journal of Surface Investigation. 2017 Jul 1;11(4):710-720. doi: 10.1134/S1027451017040073

Author

Gentselev, A. N. ; Kuznetsov, S. A. ; Baev, S. G. et al. / Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography. In: Journal of Surface Investigation. 2017 ; Vol. 11, No. 4. pp. 710-720.

BibTeX

@article{aea5852c94074a4e8004f72d8e9a8152,
title = "Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography",
abstract = "A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.",
keywords = "deep X-ray lithography, high-pass filter, laser microtreatment (cutting), planar lens, pseudometallic structure, synchrotron radiation, terahertz radiation, X-ray mask",
author = "Gentselev, {A. N.} and Kuznetsov, {S. A.} and Baev, {S. G.} and Goldenberg, {B. G.} and Lonshakov, {E. A.}",
note = "Publisher Copyright: {\textcopyright} 2017, Pleiades Publishing, Ltd.",
year = "2017",
month = jul,
day = "1",
doi = "10.1134/S1027451017040073",
language = "English",
volume = "11",
pages = "710--720",
journal = "Journal of Surface Investigation",
issn = "1027-4510",
publisher = "Maik Nauka Publishing / Springer SBM",
number = "4",

}

RIS

TY - JOUR

T1 - Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography

AU - Gentselev, A. N.

AU - Kuznetsov, S. A.

AU - Baev, S. G.

AU - Goldenberg, B. G.

AU - Lonshakov, E. A.

N1 - Publisher Copyright: © 2017, Pleiades Publishing, Ltd.

PY - 2017/7/1

Y1 - 2017/7/1

N2 - A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.

AB - A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.

KW - deep X-ray lithography

KW - high-pass filter

KW - laser microtreatment (cutting)

KW - planar lens

KW - pseudometallic structure

KW - synchrotron radiation

KW - terahertz radiation

KW - X-ray mask

UR - http://www.scopus.com/inward/record.url?scp=85028038211&partnerID=8YFLogxK

U2 - 10.1134/S1027451017040073

DO - 10.1134/S1027451017040073

M3 - Article

AN - SCOPUS:85028038211

VL - 11

SP - 710

EP - 720

JO - Journal of Surface Investigation

JF - Journal of Surface Investigation

SN - 1027-4510

IS - 4

ER -

ID: 8679039