Etching Kinetics of Si(111) Surface by Selenium Molecular Beam

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	449-455
Number of pages	7
Journal	Optoelectronics, Instrumentation and Data Processing
Volume	56
Issue number	5
DOIs	https://doi.org/10.3103/S8756699020050088
Publication status	Published - Sept 2020

etching, reflection electron microscopy, selenium, silicon, sublimation, surface

ID: 28133620