• Abdur Rahim
  • G. M. Gusev
  • Z. D. Kvon
  • E. B. Olshanetsky
  • N. N. Mikhailov
  • S. A. Dvoretsky
Original languageEnglish
Pages (from-to)55-59
Number of pages5
JournalMicroelectronic Engineering
Volume206
DOIs
Publication statusPublished - 1 Feb 2019

    OECD FOS+WOS

    Research areas

  • electron-phonon scattering, energy relaxation mechanisms, inelastic processes, Non-linear transport, Topological insulators

ID: 18295759