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Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products. / Tatarinov, A. V.; Bilera, I. V.; Avtaeva, S. V. et al.

In: Plasma Chemistry and Plasma Processing, Vol. 35, No. 5, A007, 01.09.2015, p. 845-862.

Research output: Contribution to journal › Article › peer-review

Harvard

Tatarinov, AV, Bilera, IV, Avtaeva, SV, Shakhatov, VA, Solomakhin, PV, Maladen, R, Prévé, C & Piccoz, D 2015, 'Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products', Plasma Chemistry and Plasma Processing, vol. 35, no. 5, A007, pp. 845-862. https://doi.org/10.1007/s11090-015-9635-8

APA

Tatarinov, A. V., Bilera, I. V., Avtaeva, S. V., Shakhatov, V. A., Solomakhin, P. V., Maladen, R., Prévé, C., & Piccoz, D. (2015). Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products. Plasma Chemistry and Plasma Processing, 35(5), 845-862. [A007]. https://doi.org/10.1007/s11090-015-9635-8

Vancouver

Tatarinov AV, Bilera IV, Avtaeva SV, Shakhatov VA, Solomakhin PV, Maladen R et al. Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products. Plasma Chemistry and Plasma Processing. 2015 Sept 1;35(5):845-862. A007. doi: 10.1007/s11090-015-9635-8

Author

Tatarinov, A. V. ; Bilera, I. V. ; Avtaeva, S. V. et al. / Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products. In: Plasma Chemistry and Plasma Processing. 2015 ; Vol. 35, No. 5. pp. 845-862.

BibTeX

@article{0b43e25c558f442089685ed71344b13b,
title = "Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products",
abstract = "The experimental study of the degradation of gaseous dielectrics after processing in the dielectric barrier discharge (DBD) is presented. Two pure gases trans-CF3CH=CHF (HFO-1234ze(E)), perfluoroketone CF3C(O)CF(CF3)2(C5K), and also the following mixtures 75 %HFO-1234ze(E):25 %N2, 12 %C5K:88 %N2, 18.5 %C5K: 81.5 %dry air, 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2, 9 %C5K:56 %HFO-1234ze (E):35 %CO2have been used as test-gases. A content of the decomposition products of the gases before and after a 5-h workout in the barrier discharge has been determined by means of the chromatography-mass spectrometry and gas chromatography methods. Dilution of C5K with dry air greatly increases the degree of conversion of the source gas in the barrier discharge. Dilution of HFO-1234ze(E) and C5K with nitrogen, and the use of ternary mixtures 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2and 9 %C5K:56 %HFO-1234ze(E): 35 %CO2significantly reduces the degree of conversion of the mixture compared with the source gases in the barrier discharge. After the DBD processing of two test-gases a large quantity of toxic C3F6 was found in pure C5K, and also a large number of highly toxic CF3CCH was found in pure HFO-1234ze(E). The least amount of toxic products after the DBD processing was detected in mixtures HFO-1234ze(E):N2and C5K:HFO-1234ze(E):N2. The mixture C5K:HFO-1234ze(E):N2has the best features among studied mixtures.",
keywords = "Barrier discharge processing, Gas chromatography, Hydrofluoroolefins, Perfluoroketone, SF",
author = "Tatarinov, {A. V.} and Bilera, {I. V.} and Avtaeva, {S. V.} and Shakhatov, {V. A.} and Solomakhin, {P. V.} and R. Maladen and C. Pr{\'e}v{\'e} and D. Piccoz",
note = "Publisher Copyright: {\textcopyright} Springer Science+Business Media New York 2015. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.",
year = "2015",
month = sep,
day = "1",
doi = "10.1007/s11090-015-9635-8",
language = "English",
volume = "35",
pages = "845--862",
journal = "Plasma Chemistry and Plasma Processing",
issn = "0272-4324",
publisher = "Springer Science + Business Media",
number = "5",

}

RIS

TY - JOUR

T1 - Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, their mixtures with air, N2, CO2and analysis of their decomposition products

AU - Tatarinov, A. V.

AU - Bilera, I. V.

AU - Avtaeva, S. V.

AU - Shakhatov, V. A.

AU - Solomakhin, P. V.

AU - Maladen, R.

AU - Prévé, C.

AU - Piccoz, D.

N1 - Publisher Copyright: © Springer Science+Business Media New York 2015. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 2015/9/1

Y1 - 2015/9/1

N2 - The experimental study of the degradation of gaseous dielectrics after processing in the dielectric barrier discharge (DBD) is presented. Two pure gases trans-CF3CH=CHF (HFO-1234ze(E)), perfluoroketone CF3C(O)CF(CF3)2(C5K), and also the following mixtures 75 %HFO-1234ze(E):25 %N2, 12 %C5K:88 %N2, 18.5 %C5K: 81.5 %dry air, 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2, 9 %C5K:56 %HFO-1234ze (E):35 %CO2have been used as test-gases. A content of the decomposition products of the gases before and after a 5-h workout in the barrier discharge has been determined by means of the chromatography-mass spectrometry and gas chromatography methods. Dilution of C5K with dry air greatly increases the degree of conversion of the source gas in the barrier discharge. Dilution of HFO-1234ze(E) and C5K with nitrogen, and the use of ternary mixtures 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2and 9 %C5K:56 %HFO-1234ze(E): 35 %CO2significantly reduces the degree of conversion of the mixture compared with the source gases in the barrier discharge. After the DBD processing of two test-gases a large quantity of toxic C3F6 was found in pure C5K, and also a large number of highly toxic CF3CCH was found in pure HFO-1234ze(E). The least amount of toxic products after the DBD processing was detected in mixtures HFO-1234ze(E):N2and C5K:HFO-1234ze(E):N2. The mixture C5K:HFO-1234ze(E):N2has the best features among studied mixtures.

AB - The experimental study of the degradation of gaseous dielectrics after processing in the dielectric barrier discharge (DBD) is presented. Two pure gases trans-CF3CH=CHF (HFO-1234ze(E)), perfluoroketone CF3C(O)CF(CF3)2(C5K), and also the following mixtures 75 %HFO-1234ze(E):25 %N2, 12 %C5K:88 %N2, 18.5 %C5K: 81.5 %dry air, 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2, 9 %C5K:56 %HFO-1234ze (E):35 %CO2have been used as test-gases. A content of the decomposition products of the gases before and after a 5-h workout in the barrier discharge has been determined by means of the chromatography-mass spectrometry and gas chromatography methods. Dilution of C5K with dry air greatly increases the degree of conversion of the source gas in the barrier discharge. Dilution of HFO-1234ze(E) and C5K with nitrogen, and the use of ternary mixtures 9 %C5K:57.5 %HFO-1234ze(E):33.5 %N2and 9 %C5K:56 %HFO-1234ze(E): 35 %CO2significantly reduces the degree of conversion of the mixture compared with the source gases in the barrier discharge. After the DBD processing of two test-gases a large quantity of toxic C3F6 was found in pure C5K, and also a large number of highly toxic CF3CCH was found in pure HFO-1234ze(E). The least amount of toxic products after the DBD processing was detected in mixtures HFO-1234ze(E):N2and C5K:HFO-1234ze(E):N2. The mixture C5K:HFO-1234ze(E):N2has the best features among studied mixtures.

KW - Barrier discharge processing

KW - Gas chromatography

KW - Hydrofluoroolefins

KW - Perfluoroketone

KW - SF

UR - http://www.scopus.com/inward/record.url?scp=84943348900&partnerID=8YFLogxK

U2 - 10.1007/s11090-015-9635-8

DO - 10.1007/s11090-015-9635-8

M3 - Article

AN - SCOPUS:84943348900

VL - 35

SP - 845

EP - 862

JO - Plasma Chemistry and Plasma Processing

JF - Plasma Chemistry and Plasma Processing

SN - 0272-4324

IS - 5

M1 - A007

ER -

ID: 27436337