Deposition of oxide nanostructures by nanosecond laser ablation of silicon in an oxygen-containing background gas

Research output: Contribution to journal › Article › peer-review

Translated title of the contribution	Осаждение оксидных наноструктур наносекундной лазерной абляцией кремния в кислородсодержащем фоновом газе
Original language	English
Article number	8
Pages (from-to)	549-554
Number of pages	6
Journal	Thermophysics and Aeromechanics
Volume	28
Issue number	4
DOIs	https://doi.org/10.1134/S0869864321040089
Publication status	Published - Jul 2021

laser ablation in background gas, non-stoichiometric silicon oxide, pulsed laser deposition, thin films

ID: 35240676