Comparative study of electron-beam crystallization of amorphous hafnium oxides HfO2 and HfO x (x = 1.82) › Research Explorer

DOI

https://doi.org/10.1007/s42452-020-3102-8
Final published version

A. K. Gerasimova
V. Sh Aliev
G. K. Krivyakin
V. A. Voronkovskii

Original language	English
Article number	1273
Number of pages	7
Journal	SN Applied Sciences
Volume	2
Issue number	7
DOIs	https://doi.org/10.1007/s42452-020-3102-8
Publication status	Published - Jul 2020

OECD FOS+WOS

Research areas

Amorphous dielectrics, Electron-beam crystallization, HfO, Non-stoichiometric oxides, ReRAM

ID: 27879972