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Chemical vapour deposition of Ir-based coatings : Chemistry, processes and applications. / Vasilyev, V. Yu; Morozova, N. B.; Basova, T. V. et al.

In: RSC Advances, Vol. 5, No. 41, 2015, p. 32034-32063.

Research output: Contribution to journal › Review article › peer-review

Harvard

Vasilyev, VY, Morozova, NB, Basova, TV, Igumenov, IK & Hassan, A 2015, 'Chemical vapour deposition of Ir-based coatings: Chemistry, processes and applications', RSC Advances, vol. 5, no. 41, pp. 32034-32063. https://doi.org/10.1039/c5ra03566j

APA

Vasilyev, V. Y., Morozova, N. B., Basova, T. V., Igumenov, I. K., & Hassan, A. (2015). Chemical vapour deposition of Ir-based coatings: Chemistry, processes and applications. RSC Advances, 5(41), 32034-32063. https://doi.org/10.1039/c5ra03566j

Vancouver

Vasilyev VY, Morozova NB, Basova TV, Igumenov IK, Hassan A. Chemical vapour deposition of Ir-based coatings: Chemistry, processes and applications. RSC Advances. 2015;5(41):32034-32063. doi: 10.1039/c5ra03566j

Author

Vasilyev, V. Yu ; Morozova, N. B. ; Basova, T. V. et al. / Chemical vapour deposition of Ir-based coatings : Chemistry, processes and applications. In: RSC Advances. 2015 ; Vol. 5, No. 41. pp. 32034-32063.

BibTeX

@article{f2a1c6fb822340a996d1c8ba4d6c73be,
title = "Chemical vapour deposition of Ir-based coatings: Chemistry, processes and applications",
abstract = "Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented. This journal is",
author = "Vasilyev, {V. Yu} and Morozova, {N. B.} and Basova, {T. V.} and Igumenov, {I. K.} and A. Hassan",
year = "2015",
doi = "10.1039/c5ra03566j",
language = "English",
volume = "5",
pages = "32034--32063",
journal = "RSC Advances",
issn = "2046-2069",
publisher = "ROYAL SOC CHEMISTRY",
number = "41",

}

RIS

TY - JOUR

T1 - Chemical vapour deposition of Ir-based coatings

T2 - Chemistry, processes and applications

AU - Vasilyev, V. Yu

AU - Morozova, N. B.

AU - Basova, T. V.

AU - Igumenov, I. K.

AU - Hassan, A.

PY - 2015

Y1 - 2015

N2 - Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented. This journal is

AB - Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented. This journal is

UR - http://www.scopus.com/inward/record.url?scp=84927639585&partnerID=8YFLogxK

U2 - 10.1039/c5ra03566j

DO - 10.1039/c5ra03566j

M3 - Review article

AN - SCOPUS:84927639585

VL - 5

SP - 32034

EP - 32063

JO - RSC Advances

JF - RSC Advances

SN - 2046-2069

IS - 41

ER -

ID: 25435908