• V. V. Ratnikov
  • M. P. Sheglov
  • B. Ya Ber
  • D. Yu Kazantsev
  • I. V. Osinnykh
  • T. V. Malin
  • K. S. Zhuravlev
Original languageEnglish
Pages (from-to)221-225
Number of pages5
JournalSemiconductors
Volume52
Issue number2
DOIs
Publication statusPublished - 1 Feb 2018

    OECD FOS+WOS

    Research areas

  • CHEMICAL-VAPOR-DEPOSITION, THIN-FILMS, GAN FILMS, SI, COALESCENCE, CRACKING

ID: 10426937