Atomic Processes on the Silicon Surface

Original language	English
Title of host publication	Advances in Semiconductor Nanostructures
Subtitle of host publication	Growth, Characterization, Properties and Applications
Editors	AV Latyshev, AV Dvurechenskii, AL Aseev
Publisher	Elsevier Science Inc.
Pages	189-221
Number of pages	33
ISBN (Electronic)	9780128105139
ISBN (Print)	9780128105122
DOIs	https://doi.org/10.1016/B978-0-12-810512-2.00008-1
Publication status	Published - 1 Jan 2017

In situ REM, Monatomic steps, Schwöbel barriers pyramid-like growth, Step-bunches, Surface instabilities, Two-dimensional nucleation and growth, Vacancies, SI(111) STEPPED SURFACE, CLEAN SI(111), IN-SITU REM, REFLECTION ELECTRON-MICROSCOPY, ELEVATED-TEMPERATURES, VICINAL SI(111), SCANNING-TUNNELING-MICROSCOPY, THIN-FILM GROWTH, ULTRAHIGH-VACUUM, INITIAL-STAGES

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