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Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings. / Dostovalov, A. V.; Korolkov, V. P.; Terentyev, V. S. et al.

2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017. Vol. Part F134321 Electromagnetics Academy, 2018. p. 3768-3770 (Progress in Electromagnetics Research Symposium).

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Harvard

Dostovalov, AV, Korolkov, VP, Terentyev, VS & Babin, SA 2018, Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings. in 2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017. vol. Part F134321, Progress in Electromagnetics Research Symposium, Electromagnetics Academy, pp. 3768-3770, 2017 Progress In Electromagnetics Research Symposium - Spring, PIERS 2017, St. Petersburg, Russian Federation, 22.05.2017. https://doi.org/10.1109/PIERS.2017.8262413

APA

Dostovalov, A. V., Korolkov, V. P., Terentyev, V. S., & Babin, S. A. (2018). Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings. In 2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017 (Vol. Part F134321, pp. 3768-3770). (Progress in Electromagnetics Research Symposium). Electromagnetics Academy. https://doi.org/10.1109/PIERS.2017.8262413

Vancouver

Dostovalov AV, Korolkov VP, Terentyev VS, Babin SA. Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings. In 2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017. Vol. Part F134321. Electromagnetics Academy. 2018. p. 3768-3770. (Progress in Electromagnetics Research Symposium). doi: 10.1109/PIERS.2017.8262413

Author

Dostovalov, A. V. ; Korolkov, V. P. ; Terentyev, V. S. et al. / Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings. 2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017. Vol. Part F134321 Electromagnetics Academy, 2018. pp. 3768-3770 (Progress in Electromagnetics Research Symposium).

BibTeX

@inproceedings{3b5aef5202394f4d8c1b49845208bfd9,
title = "Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings",
abstract = "The paper presents the results of the formation of thermochemical laser induced periodic surface structure on Cr thin films (40-350 nm) that was sputtered on the glass substrate. The different dependence of TLIPSS formation on processing rate in case of thin (40 nm) and thick (350 nm) is observed.",
author = "Dostovalov, {A. V.} and Korolkov, {V. P.} and Terentyev, {V. S.} and Babin, {S. A.}",
year = "2018",
month = jan,
day = "16",
doi = "10.1109/PIERS.2017.8262413",
language = "English",
volume = "Part F134321",
series = "Progress in Electromagnetics Research Symposium",
publisher = "Electromagnetics Academy",
pages = "3768--3770",
booktitle = "2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017",
address = "United States",
note = "2017 Progress In Electromagnetics Research Symposium - Spring, PIERS 2017 ; Conference date: 22-05-2017 Through 25-05-2017",

}

RIS

TY - GEN

T1 - Applications of fs laser radiation for formation of thermochemical lipss on Cr films and fabrication of submicron amplitude gratings

AU - Dostovalov, A. V.

AU - Korolkov, V. P.

AU - Terentyev, V. S.

AU - Babin, S. A.

PY - 2018/1/16

Y1 - 2018/1/16

N2 - The paper presents the results of the formation of thermochemical laser induced periodic surface structure on Cr thin films (40-350 nm) that was sputtered on the glass substrate. The different dependence of TLIPSS formation on processing rate in case of thin (40 nm) and thick (350 nm) is observed.

AB - The paper presents the results of the formation of thermochemical laser induced periodic surface structure on Cr thin films (40-350 nm) that was sputtered on the glass substrate. The different dependence of TLIPSS formation on processing rate in case of thin (40 nm) and thick (350 nm) is observed.

UR - http://www.scopus.com/inward/record.url?scp=85044957840&partnerID=8YFLogxK

U2 - 10.1109/PIERS.2017.8262413

DO - 10.1109/PIERS.2017.8262413

M3 - Conference contribution

AN - SCOPUS:85044957840

VL - Part F134321

T3 - Progress in Electromagnetics Research Symposium

SP - 3768

EP - 3770

BT - 2017 Progress in Electromagnetics Research Symposium - Spring, PIERS 2017

PB - Electromagnetics Academy

T2 - 2017 Progress In Electromagnetics Research Symposium - Spring, PIERS 2017

Y2 - 22 May 2017 through 25 May 2017

ER -

ID: 12417308