Standard

Application of RF discharge in oxygen to create highly oxidized metal layers. / Stadnichenko, A. I.; Kibis, L. S.; Svintsitskiy, D. A. et al.

In: Surface Engineering, Vol. 34, No. 1, 02.01.2018, p. 1-5.

Research output: Contribution to journal › Article › peer-review

Harvard

Stadnichenko, AI, Kibis, LS, Svintsitskiy, DA, Koshcheev, SV & Boronin, AI 2018, 'Application of RF discharge in oxygen to create highly oxidized metal layers', Surface Engineering, vol. 34, no. 1, pp. 1-5. https://doi.org/10.1179/1743294415Y.0000000010

APA

Stadnichenko, A. I., Kibis, L. S., Svintsitskiy, D. A., Koshcheev, S. V., & Boronin, A. I. (2018). Application of RF discharge in oxygen to create highly oxidized metal layers. Surface Engineering, 34(1), 1-5. https://doi.org/10.1179/1743294415Y.0000000010

Vancouver

Stadnichenko AI, Kibis LS, Svintsitskiy DA, Koshcheev SV, Boronin AI. Application of RF discharge in oxygen to create highly oxidized metal layers. Surface Engineering. 2018 Jan 2;34(1):1-5. doi: 10.1179/1743294415Y.0000000010

Author

Stadnichenko, A. I. ; Kibis, L. S. ; Svintsitskiy, D. A. et al. / Application of RF discharge in oxygen to create highly oxidized metal layers. In: Surface Engineering. 2018 ; Vol. 34, No. 1. pp. 1-5.

BibTeX

@article{6ec41b25ccf643128913f8eb16c80df8,
title = "Application of RF discharge in oxygen to create highly oxidized metal layers",
abstract = "The radio frequency (RF) discharge in an oxygen atmosphere was used to produce metal oxide films. The high efficiency of the RF discharge technique for metal oxidation at room temperature was demonstrated for gold, silver and copper foils. Oxide films up to 10 nm in thickness were obtained. The produced oxide films were studied by X-ray photoelectron spectroscopy (XPS). The XPS data showed the formation of oxidised species: Cu2+, Ag1+ and Au3+. Analysis of the oxygen species was performed using O1s spectra. For copper and silver foils, the formation of additional oxygen species apart from oxygen in the structure of oxides was shown. The reaction probability toward oxidation of carbon monoxide (CO) was estimated for all oxidised layers. It was established that gold and silver oxide films interacted with CO at room temperature, while cupric oxide showed high activity at temperature >353 K.",
keywords = "CO oxidation, cupric oxide, Gold oxide, RF plasma, silver oxide, XPS",
author = "Stadnichenko, {A. I.} and Kibis, {L. S.} and Svintsitskiy, {D. A.} and Koshcheev, {S. V.} and Boronin, {A. I.}",
year = "2018",
month = jan,
day = "2",
doi = "10.1179/1743294415Y.0000000010",
language = "English",
volume = "34",
pages = "1--5",
journal = "Surface Engineering",
issn = "0267-0844",
publisher = "Maney Publishing",
number = "1",

}

RIS

TY - JOUR

T1 - Application of RF discharge in oxygen to create highly oxidized metal layers

AU - Stadnichenko, A. I.

AU - Kibis, L. S.

AU - Svintsitskiy, D. A.

AU - Koshcheev, S. V.

AU - Boronin, A. I.

PY - 2018/1/2

Y1 - 2018/1/2

N2 - The radio frequency (RF) discharge in an oxygen atmosphere was used to produce metal oxide films. The high efficiency of the RF discharge technique for metal oxidation at room temperature was demonstrated for gold, silver and copper foils. Oxide films up to 10 nm in thickness were obtained. The produced oxide films were studied by X-ray photoelectron spectroscopy (XPS). The XPS data showed the formation of oxidised species: Cu2+, Ag1+ and Au3+. Analysis of the oxygen species was performed using O1s spectra. For copper and silver foils, the formation of additional oxygen species apart from oxygen in the structure of oxides was shown. The reaction probability toward oxidation of carbon monoxide (CO) was estimated for all oxidised layers. It was established that gold and silver oxide films interacted with CO at room temperature, while cupric oxide showed high activity at temperature >353 K.

AB - The radio frequency (RF) discharge in an oxygen atmosphere was used to produce metal oxide films. The high efficiency of the RF discharge technique for metal oxidation at room temperature was demonstrated for gold, silver and copper foils. Oxide films up to 10 nm in thickness were obtained. The produced oxide films were studied by X-ray photoelectron spectroscopy (XPS). The XPS data showed the formation of oxidised species: Cu2+, Ag1+ and Au3+. Analysis of the oxygen species was performed using O1s spectra. For copper and silver foils, the formation of additional oxygen species apart from oxygen in the structure of oxides was shown. The reaction probability toward oxidation of carbon monoxide (CO) was estimated for all oxidised layers. It was established that gold and silver oxide films interacted with CO at room temperature, while cupric oxide showed high activity at temperature >353 K.

KW - CO oxidation

KW - cupric oxide

KW - Gold oxide

KW - RF plasma

KW - silver oxide

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=84978521866&partnerID=8YFLogxK

U2 - 10.1179/1743294415Y.0000000010

DO - 10.1179/1743294415Y.0000000010

M3 - Article

AN - SCOPUS:84978521866

VL - 34

SP - 1

EP - 5

JO - Surface Engineering

JF - Surface Engineering

SN - 0267-0844

IS - 1

ER -

ID: 12081286