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XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species. / Kibis, Lidiya S.; Stadnichenko, Andrey I.; Koscheev, Sergey V. и др.

в: Journal of Physical Chemistry C, Том 120, № 34, 01.09.2016, стр. 19142-19150.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

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Kibis LS, Stadnichenko AI, Koscheev SV, Zaikovskii VI, Boronin AI. XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species. Journal of Physical Chemistry C. 2016 сент. 1;120(34):19142-19150. doi: 10.1021/acs.jpcc.6b05219

Author

Kibis, Lidiya S. ; Stadnichenko, Andrey I. ; Koscheev, Sergey V. и др. / XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species. в: Journal of Physical Chemistry C. 2016 ; Том 120, № 34. стр. 19142-19150.

BibTeX

@article{069f899ebc054c5a86c03cc2be4445d5,
title = "XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species",
abstract = "Studies of highly oxidized rhodium species as potential active sites in catalytic oxidation reactions are of great interest. In this work, we investigated the properties of highly oxidized nanostructured rhodium film prepared by radio frequency discharge in an oxygen atmosphere. The charge states of Rh in RhOx particles, their thermal stability, and reactivity toward CO were analyzed in comparison with the properties of thermally prepared Rh2O3 oxide. The formation of Rh4+ species in a composition of Rh4+/Rh3+ oxyhydroxide structures was shown to take place in plasma-synthesized films. The highly oxidized rhodium species was stable up to 150 °C and demonstrated reactivity in a CO oxidation reaction at 100 °C. The reoxidation of a partially reduced Rh/RhOx film was observed at 100 °C under treatment with molecular O2. However, Rh4+ species were not recovered under such conditions.",
author = "Kibis, {Lidiya S.} and Stadnichenko, {Andrey I.} and Koscheev, {Sergey V.} and Zaikovskii, {Vladimir I.} and Boronin, {Andrei I.}",
year = "2016",
month = sep,
day = "1",
doi = "10.1021/acs.jpcc.6b05219",
language = "English",
volume = "120",
pages = "19142--19150",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "34",

}

RIS

TY - JOUR

T1 - XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species

AU - Kibis, Lidiya S.

AU - Stadnichenko, Andrey I.

AU - Koscheev, Sergey V.

AU - Zaikovskii, Vladimir I.

AU - Boronin, Andrei I.

PY - 2016/9/1

Y1 - 2016/9/1

N2 - Studies of highly oxidized rhodium species as potential active sites in catalytic oxidation reactions are of great interest. In this work, we investigated the properties of highly oxidized nanostructured rhodium film prepared by radio frequency discharge in an oxygen atmosphere. The charge states of Rh in RhOx particles, their thermal stability, and reactivity toward CO were analyzed in comparison with the properties of thermally prepared Rh2O3 oxide. The formation of Rh4+ species in a composition of Rh4+/Rh3+ oxyhydroxide structures was shown to take place in plasma-synthesized films. The highly oxidized rhodium species was stable up to 150 °C and demonstrated reactivity in a CO oxidation reaction at 100 °C. The reoxidation of a partially reduced Rh/RhOx film was observed at 100 °C under treatment with molecular O2. However, Rh4+ species were not recovered under such conditions.

AB - Studies of highly oxidized rhodium species as potential active sites in catalytic oxidation reactions are of great interest. In this work, we investigated the properties of highly oxidized nanostructured rhodium film prepared by radio frequency discharge in an oxygen atmosphere. The charge states of Rh in RhOx particles, their thermal stability, and reactivity toward CO were analyzed in comparison with the properties of thermally prepared Rh2O3 oxide. The formation of Rh4+ species in a composition of Rh4+/Rh3+ oxyhydroxide structures was shown to take place in plasma-synthesized films. The highly oxidized rhodium species was stable up to 150 °C and demonstrated reactivity in a CO oxidation reaction at 100 °C. The reoxidation of a partially reduced Rh/RhOx film was observed at 100 °C under treatment with molecular O2. However, Rh4+ species were not recovered under such conditions.

UR - http://www.scopus.com/inward/record.url?scp=84984873370&partnerID=8YFLogxK

U2 - 10.1021/acs.jpcc.6b05219

DO - 10.1021/acs.jpcc.6b05219

M3 - Article

AN - SCOPUS:84984873370

VL - 120

SP - 19142

EP - 19150

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 34

ER -

ID: 25416263