Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2: La films. / Perevalov, Timofey; Prosvirin, Igor P.; Suprun, Evgenii A. и др.
в: Journal of science-Advanced materials and devices, Том 6, № 4, 12.2021, стр. 595-600.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2: La films
AU - Perevalov, Timofey
AU - Prosvirin, Igor P.
AU - Suprun, Evgenii A.
AU - Mehmood, Furqan
AU - Mikolajick, Thomas
AU - Schroeder, Uwe
AU - Gritsenko, Vladimir A.
N1 - Funding Information: This work was supported by the Russian Foundation for Basic Research , Grant № 20-57-12003 (XPS measurements) and under the state contract with ISP SB RAS № 0242-2021-0003 (DFT simulation), as well as by DFG Project No 430054035 (MI 1247/16-1). Publisher Copyright: © 2021 The Authors
PY - 2021/12
Y1 - 2021/12
N2 - HfxZr1-xO2 and lanthanum-doped HfxZr1-xO2:La thin films are candidates for applications in ferroelectric random-access memory. Here, we explore the atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2:La thin films grown by atomic layer deposition. Using X-ray photoelectron spectroscopy, it was found that the oxides under study have an almost identical electronic structure and a bandgap of about 5.4 eV. The Hf0.5Zr0.5O2:La film was shown to consist of the mixture of Hf0.5Zr0.5O2 and La2O3 phases. The bombardment with argon ions of the studied films leads to oxygen vacancy generation in the near-surface layer. The oxygen vacancy concentrations in the bombarded films were evaluated from the comparison of experimental valence band photoelectron spectra with the theoretical ones calculated using the density functional theory.
AB - HfxZr1-xO2 and lanthanum-doped HfxZr1-xO2:La thin films are candidates for applications in ferroelectric random-access memory. Here, we explore the atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2:La thin films grown by atomic layer deposition. Using X-ray photoelectron spectroscopy, it was found that the oxides under study have an almost identical electronic structure and a bandgap of about 5.4 eV. The Hf0.5Zr0.5O2:La film was shown to consist of the mixture of Hf0.5Zr0.5O2 and La2O3 phases. The bombardment with argon ions of the studied films leads to oxygen vacancy generation in the near-surface layer. The oxygen vacancy concentrations in the bombarded films were evaluated from the comparison of experimental valence band photoelectron spectra with the theoretical ones calculated using the density functional theory.
KW - FeRAM
KW - XPS
KW - Oxygen vacancy
KW - Electronic structure
KW - HfZrO
KW - THIN-FILMS
KW - OXYGEN VACANCIES
KW - OXIDE
UR - http://www.scopus.com/inward/record.url?scp=85122726054&partnerID=8YFLogxK
U2 - 10.1016/j.jsamd.2021.08.001
DO - 10.1016/j.jsamd.2021.08.001
M3 - Article
VL - 6
SP - 595
EP - 600
JO - Journal of science-Advanced materials and devices
JF - Journal of science-Advanced materials and devices
SN - 2468-2284
IS - 4
ER -
ID: 34678497