Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Surface Fermi level tuning in thin epitaxial BiySb2−yTe3−xSex/Si(111) films. / Stepina, N. P.; Golyashov, V. A.; Bazhenov, A. O. и др.
в: Applied Physics Letters, Том 126, № 22, 223102, 2025.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Surface Fermi level tuning in thin epitaxial BiySb2−yTe3−xSex/Si(111) films
AU - Stepina, N. P.
AU - Golyashov, V. A.
AU - Bazhenov, A. O.
AU - Ishchenko, D. V.
AU - Kumar, N.
AU - Shumilin, A. V.
AU - Tereshchenko, O. E.
N1 - This work was supported by the Russian Science Foundation (Grant No. 24-22-20066) and Government of the Novosibirsk region. The authors are grateful to V. V. Kirienko for help with the contact fabrication.
PY - 2025
Y1 - 2025
N2 - The effects of chemical treatment and aging of BiySb2−yTe3−xSex 3D topological insulator (TI) thin films on the surface electronic structure, morphology, and transport properties have been studied. The surface conditions significantly affect the separation between the Dirac point (DP) and the Fermi level, which is evident in both photoemission and magnetotransport measurements and is explained by the band bending. Depending on the Fermi level's position relative to the DP, the contribution of topological surface states to the nonlinear Hall effect can be solely controlled by the antilocalization effect or enhanced by the effect of gap opening. The wide tuning of the surface Fermi level by the surface/interface modification could be utilized in metal-insulator-semiconductor structures based on a TI thin films.
AB - The effects of chemical treatment and aging of BiySb2−yTe3−xSex 3D topological insulator (TI) thin films on the surface electronic structure, morphology, and transport properties have been studied. The surface conditions significantly affect the separation between the Dirac point (DP) and the Fermi level, which is evident in both photoemission and magnetotransport measurements and is explained by the band bending. Depending on the Fermi level's position relative to the DP, the contribution of topological surface states to the nonlinear Hall effect can be solely controlled by the antilocalization effect or enhanced by the effect of gap opening. The wide tuning of the surface Fermi level by the surface/interface modification could be utilized in metal-insulator-semiconductor structures based on a TI thin films.
UR - https://www.mendeley.com/catalogue/69ce78d0-84e2-35d4-ba7c-91c6fe3d9ef0/
UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-105007513502&origin=inward&txGid=4aee8ba64bb2085e1029643953cb8333
U2 - 10.1063/5.0260935
DO - 10.1063/5.0260935
M3 - Article
VL - 126
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 22
M1 - 223102
ER -
ID: 67902698