TY - JOUR

T1 - Study of electron beam uniformity in large-area multi-aperture diode with arc plasma cathode

AU - Kandaurov, I. V.

AU - Kurkuchekov, V. V.

AU - Trunev, Yu A.

PY - 2017/5/4

Y1 - 2017/5/4

N2 - The use of plasma emission cathode in the conjunction with a multiple apertured electron optical system (EOS) is promising for the multi-MW class electron beams of a large cross-sectional area. In a multi-aperture source, the beam parameters could be raised simply due to increase of the number of apertures (i.e. an effective emission area), if a uniformity of the electron emission over a large-area plasma cathode is ensured. In the presented paper, the cross-sectional distribution of the emission current density was investigated using the X-ray diagnostic technique for two versions of the diode-type EOS, with electrodes performed as flat molybdenum "grids". The first one had 241 apertures arranged hexagonally inside a circle with a diameter of 8.3 cm and the second had 499 apertures within a circle of 11.8cm diameter. The emission plasma is produced using a single arc-discharge plasma generator placed on the axis at 20 cm from the EOS. It was demonstrated that multi-aperture systems with a single on-axis plasma generator can be effectively employed to obtain large-area beams, even in the presence of the guiding magnetic field. All apertures are emitting in the 499-apertured EOS. The beam current density is quite uniform up to the radius 2.5cm and gradually decreases to the periphery.

AB - The use of plasma emission cathode in the conjunction with a multiple apertured electron optical system (EOS) is promising for the multi-MW class electron beams of a large cross-sectional area. In a multi-aperture source, the beam parameters could be raised simply due to increase of the number of apertures (i.e. an effective emission area), if a uniformity of the electron emission over a large-area plasma cathode is ensured. In the presented paper, the cross-sectional distribution of the emission current density was investigated using the X-ray diagnostic technique for two versions of the diode-type EOS, with electrodes performed as flat molybdenum "grids". The first one had 241 apertures arranged hexagonally inside a circle with a diameter of 8.3 cm and the second had 499 apertures within a circle of 11.8cm diameter. The emission plasma is produced using a single arc-discharge plasma generator placed on the axis at 20 cm from the EOS. It was demonstrated that multi-aperture systems with a single on-axis plasma generator can be effectively employed to obtain large-area beams, even in the presence of the guiding magnetic field. All apertures are emitting in the 499-apertured EOS. The beam current density is quite uniform up to the radius 2.5cm and gradually decreases to the periphery.

UR - http://www.scopus.com/inward/record.url?scp=85020045891&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/830/1/012032

DO - 10.1088/1742-6596/830/1/012032

M3 - Conference article

AN - SCOPUS:85020045891

VL - 830

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012032

ER -