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Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. / Fainer, N. I.; Plekhanov, A. G.; Asanov, I. P.

в: Glass Physics and Chemistry, Том 43, № 5, 01.09.2017, стр. 410-416.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Fainer, NI, Plekhanov, AG & Asanov, IP 2017, 'Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy', Glass Physics and Chemistry, Том. 43, № 5, стр. 410-416. https://doi.org/10.1134/S1087659617050042

APA

Fainer, N. I., Plekhanov, A. G., & Asanov, I. P. (2017). Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. Glass Physics and Chemistry, 43(5), 410-416. https://doi.org/10.1134/S1087659617050042

Vancouver

Fainer NI, Plekhanov AG, Asanov IP. Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. Glass Physics and Chemistry. 2017 сент. 1;43(5):410-416. doi: 10.1134/S1087659617050042

Author

Fainer, N. I. ; Plekhanov, A. G. ; Asanov, I. P. / Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. в: Glass Physics and Chemistry. 2017 ; Том 43, № 5. стр. 410-416.

BibTeX

@article{317bfa3ee1ee45608b5f0f319c01cc36,
title = "Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy",
abstract = "The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.",
keywords = "1,1,3,3-tetramethyldisilazane, EDS, hydrogenated silicon oxycarbonitride, plasma-chemical synthesis, XPS",
author = "Fainer, {N. I.} and Plekhanov, {A. G.} and Asanov, {I. P.}",
year = "2017",
month = sep,
day = "1",
doi = "10.1134/S1087659617050042",
language = "English",
volume = "43",
pages = "410--416",
journal = "Glass Physics and Chemistry",
issn = "1087-6596",
publisher = "PLEIADES PUBLISHING INC",
number = "5",

}

RIS

TY - JOUR

T1 - Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

AU - Fainer, N. I.

AU - Plekhanov, A. G.

AU - Asanov, I. P.

PY - 2017/9/1

Y1 - 2017/9/1

N2 - The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.

AB - The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.

KW - 1,1,3,3-tetramethyldisilazane

KW - EDS

KW - hydrogenated silicon oxycarbonitride

KW - plasma-chemical synthesis

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=85031416569&partnerID=8YFLogxK

U2 - 10.1134/S1087659617050042

DO - 10.1134/S1087659617050042

M3 - Article

AN - SCOPUS:85031416569

VL - 43

SP - 410

EP - 416

JO - Glass Physics and Chemistry

JF - Glass Physics and Chemistry

SN - 1087-6596

IS - 5

ER -

ID: 9891667