Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Optimization of Parameters of Graphene Synthesis on Copper Foil at Low Methan Pressure. / Arkhipov, V. E.; Gusel′nikov, A. V.; Popov, K. M. и др.
в: Journal of Structural Chemistry, Том 59, № 4, 01.07.2018, стр. 759-765.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Optimization of Parameters of Graphene Synthesis on Copper Foil at Low Methan Pressure
AU - Arkhipov, V. E.
AU - Gusel′nikov, A. V.
AU - Popov, K. M.
AU - Gevko, P. N.
AU - Fedoseeva, Yu V.
AU - Smirnov, D. A.
AU - Bulusheva, L. G.
AU - Okotrub, A. V.
N1 - Publisher Copyright: © 2018, Pleiades Publishing, Ltd.
PY - 2018/7/1
Y1 - 2018/7/1
N2 - Graphene films on copper foils were synthesized using low-pressure (2200-2800 Pa) chemical vapor deposition (CVD) from methane/hydrogen mixtures. The number of graphene layers is shown to be dependent on the composition of gas mixture and synthesis parameters. The annealing procedure of copper foils used as substrates was optimized to obtain high quality graphene. Atomic and electronic structures of graphene on copper and SiO2/Si substrates were studied by Raman, X-ray photoelectron, and near-edge X-ray absorption fine structure spectroscopy methods.
AB - Graphene films on copper foils were synthesized using low-pressure (2200-2800 Pa) chemical vapor deposition (CVD) from methane/hydrogen mixtures. The number of graphene layers is shown to be dependent on the composition of gas mixture and synthesis parameters. The annealing procedure of copper foils used as substrates was optimized to obtain high quality graphene. Atomic and electronic structures of graphene on copper and SiO2/Si substrates were studied by Raman, X-ray photoelectron, and near-edge X-ray absorption fine structure spectroscopy methods.
KW - copper foil
KW - CVD synthesis
KW - electronic structure
KW - graphene
KW - XPS
UR - http://www.scopus.com/inward/record.url?scp=85053878158&partnerID=8YFLogxK
U2 - 10.1134/S0022476618040029
DO - 10.1134/S0022476618040029
M3 - Article
AN - SCOPUS:85053878158
VL - 59
SP - 759
EP - 765
JO - Journal of Structural Chemistry
JF - Journal of Structural Chemistry
SN - 0022-4766
IS - 4
ER -
ID: 16735654