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On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface. / Rogilo, D. I.; Fedina, L. I.; Kosolobov, S. S. и др.

в: Surface Science, Том 667, 01.01.2018, стр. 1-7.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Rogilo, DI, Fedina, LI, Kosolobov, SS & Latyshev, AV 2018, 'On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface', Surface Science, Том. 667, стр. 1-7. https://doi.org/10.1016/j.susc.2017.09.009

APA

Rogilo, D. I., Fedina, L. I., Kosolobov, S. S., & Latyshev, A. V. (2018). On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface. Surface Science, 667, 1-7. https://doi.org/10.1016/j.susc.2017.09.009

Vancouver

Rogilo DI, Fedina LI, Kosolobov SS, Latyshev AV. On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface. Surface Science. 2018 янв. 1;667:1-7. doi: 10.1016/j.susc.2017.09.009

Author

Rogilo, D. I. ; Fedina, L. I. ; Kosolobov, S. S. и др. / On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface. в: Surface Science. 2018 ; Том 667. стр. 1-7.

BibTeX

@article{b80c034582714fd8b23dff7554811331,
title = "On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface",
abstract = "Two-dimensional (2D) Si island nucleation has been studied by in situ reflection electron microscopy within a wide temperature range (650–1090 °С) on large-scale (∼10–100 µm) terraces to exclude the impact of step permeability and adatom sink to steps. The dependence of 2D island concentration N2D on substrate temperature T and Si deposition rate R displays N2D∝Rχexp (E2D/kT) scaling which parameters change from χ≈0.81, E2D≈1.02 eV to χ≈0.5, E2D≈1.8 eV when Si(111) surface converts from (1 × 1) structure to (7 × 7) reconstruction. We propose that this strong E2D rise accompanied by χ reduction is caused by the change of dominating diffusing particles from adatoms to reconstruction induced nanoclusters. Using a rate-equation model developed to account the dynamics of both diffusing species on the Si(111)-(7 × 7) surface, we show that a stable nucleus of a 2D island appears when two mobile nanoclusters merge together while nucleation kinetics is limited by their attachment to island edges.",
keywords = "Epitaxial growth, Nucleation, Silicon, Superstructure, Surface diffusion, X 7 SURFACE, MOLECULAR-BEAM EPITAXY, 7X7 RECONSTRUCTION, UHV-REM, X-1 SURFACE, SI MAGIC CLUSTERS, THIN-FILM GROWTH, DIFFUSION, STEP PERMEABILITY, LIMITED KINETICS",
author = "Rogilo, {D. I.} and Fedina, {L. I.} and Kosolobov, {S. S.} and Latyshev, {A. V.}",
year = "2018",
month = jan,
day = "1",
doi = "10.1016/j.susc.2017.09.009",
language = "English",
volume = "667",
pages = "1--7",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - On the role of mobile nanoclusters in 2D island nucleation on Si(111)-(7 × 7) surface

AU - Rogilo, D. I.

AU - Fedina, L. I.

AU - Kosolobov, S. S.

AU - Latyshev, A. V.

PY - 2018/1/1

Y1 - 2018/1/1

N2 - Two-dimensional (2D) Si island nucleation has been studied by in situ reflection electron microscopy within a wide temperature range (650–1090 °С) on large-scale (∼10–100 µm) terraces to exclude the impact of step permeability and adatom sink to steps. The dependence of 2D island concentration N2D on substrate temperature T and Si deposition rate R displays N2D∝Rχexp (E2D/kT) scaling which parameters change from χ≈0.81, E2D≈1.02 eV to χ≈0.5, E2D≈1.8 eV when Si(111) surface converts from (1 × 1) structure to (7 × 7) reconstruction. We propose that this strong E2D rise accompanied by χ reduction is caused by the change of dominating diffusing particles from adatoms to reconstruction induced nanoclusters. Using a rate-equation model developed to account the dynamics of both diffusing species on the Si(111)-(7 × 7) surface, we show that a stable nucleus of a 2D island appears when two mobile nanoclusters merge together while nucleation kinetics is limited by their attachment to island edges.

AB - Two-dimensional (2D) Si island nucleation has been studied by in situ reflection electron microscopy within a wide temperature range (650–1090 °С) on large-scale (∼10–100 µm) terraces to exclude the impact of step permeability and adatom sink to steps. The dependence of 2D island concentration N2D on substrate temperature T and Si deposition rate R displays N2D∝Rχexp (E2D/kT) scaling which parameters change from χ≈0.81, E2D≈1.02 eV to χ≈0.5, E2D≈1.8 eV when Si(111) surface converts from (1 × 1) structure to (7 × 7) reconstruction. We propose that this strong E2D rise accompanied by χ reduction is caused by the change of dominating diffusing particles from adatoms to reconstruction induced nanoclusters. Using a rate-equation model developed to account the dynamics of both diffusing species on the Si(111)-(7 × 7) surface, we show that a stable nucleus of a 2D island appears when two mobile nanoclusters merge together while nucleation kinetics is limited by their attachment to island edges.

KW - Epitaxial growth

KW - Nucleation

KW - Silicon

KW - Superstructure

KW - Surface diffusion

KW - X 7 SURFACE

KW - MOLECULAR-BEAM EPITAXY

KW - 7X7 RECONSTRUCTION

KW - UHV-REM

KW - X-1 SURFACE

KW - SI MAGIC CLUSTERS

KW - THIN-FILM GROWTH

KW - DIFFUSION

KW - STEP PERMEABILITY

KW - LIMITED KINETICS

UR - http://www.scopus.com/inward/record.url?scp=85029827694&partnerID=8YFLogxK

U2 - 10.1016/j.susc.2017.09.009

DO - 10.1016/j.susc.2017.09.009

M3 - Article

AN - SCOPUS:85029827694

VL - 667

SP - 1

EP - 7

JO - Surface Science

JF - Surface Science

SN - 0039-6028

ER -

ID: 12081494