Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Nucleation of Three-Dimensional Ge Islands on a Patterned Si(100) Surface. / Rudin, S. A.; Smagina, Zh V.; Zinovyev, V. A. и др.
в: Semiconductors, Том 52, № 11, 01.11.2018, стр. 1457-1461.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
}
TY - JOUR
T1 - Nucleation of Three-Dimensional Ge Islands on a Patterned Si(100) Surface
AU - Rudin, S. A.
AU - Smagina, Zh V.
AU - Zinovyev, V. A.
AU - Novikov, P. L.
AU - Nenashev, A. V.
AU - Rodyakina, E. E.
AU - Dvurechenskii, A. V.
N1 - Publisher Copyright: © 2018, Pleiades Publishing, Ltd.
PY - 2018/11/1
Y1 - 2018/11/1
N2 - Abstract: The nucleation of three-dimentional Ge islands formed on a pre-patterned Si substrate with an array of round pits is studied. It is found that the Ge islands nucleate within pits with pointed bottoms and along the perimeters of pits with flat bottoms. This effect is determined by the difference between the distributions of elastic strains at the Ge/Si interface for differently shaped pit bottoms. The results of the simulation of growth show that, in the case of pits with pointed bottoms, the most relaxed regions are at the centers of the pit bottoms and the nucleation of islands takes place just in these regions. At the same time, in the case of pits with flat bottoms, the most relaxed regions are shifted from the pit bottoms to the pit edges, resulting in the nucleation of islands along the pit perimeters.
AB - Abstract: The nucleation of three-dimentional Ge islands formed on a pre-patterned Si substrate with an array of round pits is studied. It is found that the Ge islands nucleate within pits with pointed bottoms and along the perimeters of pits with flat bottoms. This effect is determined by the difference between the distributions of elastic strains at the Ge/Si interface for differently shaped pit bottoms. The results of the simulation of growth show that, in the case of pits with pointed bottoms, the most relaxed regions are at the centers of the pit bottoms and the nucleation of islands takes place just in these regions. At the same time, in the case of pits with flat bottoms, the most relaxed regions are shifted from the pit bottoms to the pit edges, resulting in the nucleation of islands along the pit perimeters.
KW - QUANTUM DOTS
KW - GROWTH
KW - GERMANIUM
KW - SILICON
KW - NANOSTRUCTURES
KW - TRANSITION
KW - CRYSTALS
KW - PYRAMIDS
KW - SI(001)
KW - DOMES
UR - http://www.scopus.com/inward/record.url?scp=85055248071&partnerID=8YFLogxK
U2 - 10.1134/S1063782618110222
DO - 10.1134/S1063782618110222
M3 - Article
AN - SCOPUS:85055248071
VL - 52
SP - 1457
EP - 1461
JO - Semiconductors
JF - Semiconductors
SN - 1063-7826
IS - 11
ER -
ID: 17244558