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Measurements of the contact angle of Noa81 photoresist for different temperatures. / Kirichenko, Ekaterina O.; Gatapova, Elizaveta Ya.

в: MATEC Web of Conferences, Том 92, 01042, 21.12.2016.

Результаты исследований: Научные публикации в периодических изданиях › статья по материалам конференции › Рецензирование

Harvard

Kirichenko, EO & Gatapova, EY 2016, 'Measurements of the contact angle of Noa81 photoresist for different temperatures', MATEC Web of Conferences, Том. 92, 01042. https://doi.org/10.1051/matecconf/20179201042

APA

Kirichenko, E. O., & Gatapova, E. Y. (2016). Measurements of the contact angle of Noa81 photoresist for different temperatures. MATEC Web of Conferences, 92, [01042]. https://doi.org/10.1051/matecconf/20179201042

Vancouver

Kirichenko EO, Gatapova EY. Measurements of the contact angle of Noa81 photoresist for different temperatures. MATEC Web of Conferences. 2016 дек. 21;92:01042. doi: 10.1051/matecconf/20179201042

Author

Kirichenko, Ekaterina O. ; Gatapova, Elizaveta Ya. / Measurements of the contact angle of Noa81 photoresist for different temperatures. в: MATEC Web of Conferences. 2016 ; Том 92.

BibTeX

@article{1cc2d9ac2748431a8bd836204efcd42e,
title = "Measurements of the contact angle of Noa81 photoresist for different temperatures",
abstract = "In this work we study the properties of the surface, obtained by applying Noa 81 photoresist at different temperatures of the substrate. The measurement of free energy was conducted by the Owens, Wendt, Rabel and Kaelble method under isothermal conditions. The paper presents the obtained data on contact angle for different temperatures.",
author = "Kirichenko, {Ekaterina O.} and Gatapova, {Elizaveta Ya}",
year = "2016",
month = dec,
day = "21",
doi = "10.1051/matecconf/20179201042",
language = "English",
volume = "92",
journal = "MATEC Web of Conferences",
issn = "2261-236X",
publisher = "EDP Sciences",
note = "2016 Thermophysical Basis of Energy Technologies, TBET 2016 ; Conference date: 26-10-2016 Through 28-10-2016",

}

RIS

TY - JOUR

T1 - Measurements of the contact angle of Noa81 photoresist for different temperatures

AU - Kirichenko, Ekaterina O.

AU - Gatapova, Elizaveta Ya

PY - 2016/12/21

Y1 - 2016/12/21

N2 - In this work we study the properties of the surface, obtained by applying Noa 81 photoresist at different temperatures of the substrate. The measurement of free energy was conducted by the Owens, Wendt, Rabel and Kaelble method under isothermal conditions. The paper presents the obtained data on contact angle for different temperatures.

AB - In this work we study the properties of the surface, obtained by applying Noa 81 photoresist at different temperatures of the substrate. The measurement of free energy was conducted by the Owens, Wendt, Rabel and Kaelble method under isothermal conditions. The paper presents the obtained data on contact angle for different temperatures.

UR - http://www.scopus.com/inward/record.url?scp=85008709487&partnerID=8YFLogxK

U2 - 10.1051/matecconf/20179201042

DO - 10.1051/matecconf/20179201042

M3 - Conference article

AN - SCOPUS:85008709487

VL - 92

JO - MATEC Web of Conferences

JF - MATEC Web of Conferences

SN - 2261-236X

M1 - 01042

T2 - 2016 Thermophysical Basis of Energy Technologies, TBET 2016

Y2 - 26 October 2016 through 28 October 2016

ER -

ID: 23777526