TY - JOUR

T1 - Effect of annealing temperature on the morphology, structure, and optical properties of nanostructured SnO(x) films

AU - Timofeev, Vyacheslav A.

AU - Mashanov, Vladimir I.

AU - Nikiforov, Alexandr I.

AU - Azarov, Ivan A.

AU - Loshkarev, Ivan D.

AU - Korolkov, Ilya V.

AU - Gavrilova, Tatyana A.

AU - Yesin, M. Yu

AU - Chetyrin, Igor A.

PY - 2020/1/6

Y1 - 2020/1/6

N2 - Nanostructured SnO(x) films were obtained by molecular beam epitaxy (MBE). The morphology, structure, and optical properties of obtained films annealed in the temperature range of 200 °C-1000 °C were studied. The reflection high-energy electron diffraction during the film deposition by the MBE method and the x-ray phase analysis showed that the initial films are in the polycrystalline phase. A single orthorhombic SnO2 phase was obtained for the first time after annealing the SnO(x) film in the air at a temperature of about 500 °C. The sharp change in the optical constants near the temperature of 500 °C was established using ellipsometry. The pronounced absorption edge appears in the short-wave region at temperatures above 500 °C and it disappears at lower temperatures. The film thickness changed non-monotonically during the annealing in the air. At first, it grows from 45 nm to 65 nm (active oxidation to 500 °C), and then (above 600 °C) it begins to decrease. The annealing at temperatures of 500 °C-1000 °C leads to the film compaction, since the film thickness decreases to 50 nm, but the refractive index increases by 10%-15%. Optical constants track the progress of film phase and morphological changes.

AB - Nanostructured SnO(x) films were obtained by molecular beam epitaxy (MBE). The morphology, structure, and optical properties of obtained films annealed in the temperature range of 200 °C-1000 °C were studied. The reflection high-energy electron diffraction during the film deposition by the MBE method and the x-ray phase analysis showed that the initial films are in the polycrystalline phase. A single orthorhombic SnO2 phase was obtained for the first time after annealing the SnO(x) film in the air at a temperature of about 500 °C. The sharp change in the optical constants near the temperature of 500 °C was established using ellipsometry. The pronounced absorption edge appears in the short-wave region at temperatures above 500 °C and it disappears at lower temperatures. The film thickness changed non-monotonically during the annealing in the air. At first, it grows from 45 nm to 65 nm (active oxidation to 500 °C), and then (above 600 °C) it begins to decrease. The annealing at temperatures of 500 °C-1000 °C leads to the film compaction, since the film thickness decreases to 50 nm, but the refractive index increases by 10%-15%. Optical constants track the progress of film phase and morphological changes.

KW - absorption coefficient

KW - epitaxy

KW - nanostructured film

KW - tin oxide

KW - x-ray diffraction

KW - THIN-FILMS

KW - PHYSICAL-PROPERTIES

KW - TIN OXIDE-FILMS

KW - GROWTH

KW - ELLIPSOMETRY

KW - QUARTZ

UR - http://www.scopus.com/inward/record.url?scp=85077949816&partnerID=8YFLogxK

U2 - 10.1088/2053-1591/ab6122

DO - 10.1088/2053-1591/ab6122

M3 - Article

AN - SCOPUS:85077949816

VL - 7

JO - Materials Research Express

JF - Materials Research Express

SN - 2053-1591

IS - 1

M1 - 015027

ER -